公开(公告)号：US20120192741A1

公开(公告)日：2012-08-02

申请号：US13017111

申请日：2011-01-31

Applicant: MOSHE NAKASH

Inventor： MOSHE NAKASH

IPC: G03F7/20 ,  B41N1/00

CPC classification number: B41C1/1008 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/08 ,  B41C2210/10 ,  B41C2210/24 ,  B41C2210/262 ,  B41N3/036

Abstract: Lithographic printing plates can be prepared and made ready for lithographic printing with simple wet development or processing. A positive-working lithographic printing plate precursor is exposed to infrared radiation for example at 200 to 300 mJ/cm2. The exposed precursor can be simply processed with water or an aqueous solution, and uniformly exposed to radiation, heat, or both. The positive-working lithographic printing plate precursor has a hydrophilic aluminum substrate, a crosslinked hydrophilic inner layer, and an oleophilic surface layer that is weakly bonded to the crosslinked hydrophilic inner layer.

Abstract translation: 平版印刷版可以通过简单的湿法显影或加工制备并准备进行平版印刷。 将正性平版印刷版原版曝光于例如200至300mJ / cm 2的红外辐射。 暴露的前体可以用水或水溶液简单加工，并且均匀地暴露于辐射，加热或两者。 正性平版印刷版原版具有亲水性的铝基材，交联的亲水性内层和与交联的亲水性内层弱结合的亲油性表面层。