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公开(公告)号:US20080286691A1
公开(公告)日:2008-11-20
申请号:US12121458
申请日:2008-05-15
IPC分类号: G03F7/004
CPC分类号: G03F7/0397 , C08F8/12 , C08F8/14 , C08F12/22 , C08F212/14 , C08F212/32 , C08F220/18 , C08F2220/1891 , Y10S430/106 , Y10S430/111
摘要: A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): (ii) a polymerization unit represented by the formula (II): and (iii) at least one polymerization unit selected from the group consisting of a polymerization unit represented by the formula (III): and a polymerization unit represented by the formula (IV): and (B) at least one acid generator.
摘要翻译: 一种化学放大正型抗蚀剂组合物,其包含(A)树脂,其包含(i)由式(I)表示的聚合单元:(ii)由式(II)表示的聚合单元:和(iii)至少一种聚合 选自由式(III)表示的聚合单元组的单元和由式(IV)表示的聚合单元:和(B)至少一种酸产生剂。
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公开(公告)号:US20100233628A1
公开(公告)日:2010-09-16
申请号:US12719505
申请日:2010-03-08
申请人: Makoto AKITA , Isao Yoshida , Kazuhiko Hashimoto
发明人: Makoto AKITA , Isao Yoshida , Kazuhiko Hashimoto
IPC分类号: G03F7/004 , C07C69/76 , C08F232/08
CPC分类号: C07C69/00 , C07C69/78 , C07C2603/24 , C08F12/24 , C08F212/14 , C08F220/30 , G03F7/0045 , G03F7/0397 , C08F220/18 , C08F2220/185 , C08F2220/303
摘要: A compound represented by the formula (I): wherein R1 represents a hydrogen atom etc., R2 and R3 each independently represent a hydrogen atom etc., R4 represents a C1-C8 divalent hydrocarbon group, R5 represents a single bond etc., and R6 represents an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, a polymer comprising a structural unit derived from the compound represented by the formula (I) and a chemically amplified positive resist composition comprising the polymer, at least one acid generator and at least one solvent.
摘要翻译: 由式(I)表示的化合物:其中R1表示氢原子等,R2和R3各自独立地表示氢原子等,R4表示C1-C8二价烃基,R5表示单键等,以及 R6表示未取代或取代的C6-C20芳族烃基,包含衍生自由式(I)表示的化合物的结构单元的聚合物和包含聚合物,至少一种酸产生剂和至少一种酸 溶剂。
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