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    Chemically amplified positive resist composition
    2.
    发明授权
    Chemically amplified positive resist composition 有权
    化学放大正光刻胶组合物

    公开(公告)号：US07893293B2

    公开(公告)日：2011-02-22

    申请号：US12143268

    申请日：2008-06-20

    申请人： Makoto Akita ,  Isao Yoshida ,  Kazuhiko Hashimoto

    发明人： Makoto Akita ,  Isao Yoshida ,  Kazuhiko Hashimoto

    IPC分类号： C07C69/753 ,  C07C43/21 ,  C07C43/215 ,  C08F12/32 ,  G03F7/039

    CPC分类号： G03F7/0397 ,  C07C69/00 ,  C07C2603/24 ,  C08F212/14 ,  C08F212/34 ,  C08F220/18 ,  G03F7/0045 ,  G03F7/0046 ,  Y10S430/106

    摘要： A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): wherein R7 represents a hydrogen atom etc., R8 represents a C1-C4 alkyl group, p represents an integer of 1 to 3, and q represents an integer of 0 to 2, (ii) at least one polymerization unit selected from a group consisting of a polymerization unit represented by the formula (II): wherein R1 represents a hydrogen atom etc., R2 represents a C1-C8 alkyl group and ring X represents an alicyclic hydrocarbon group, and a polymerization unit represented by the formula (IV): wherein R3 represents a hydrogen atom etc., R4 and R5 independently represents a hydrogen atom etc., R10 represents a C1-C6 alkyl group etc., and (iii) a polymerization unit represented by the formula (III): wherein R3, R4 and R5 are the same as defined above, E represents a divalent hydrocarbon group, G represents a single bond etc., Z represents a carbonyl group etc. and L represents an anthryl group etc., and (B) at least one acid generator.

    摘要翻译： 一种化学放大正型抗蚀剂组合物，其包含（A）树脂，其包含（i）由式（I）表示的聚合单元：其中R7表示氢原子等，R8表示C1-C4烷基，p表示整数 为1〜3，q为0〜2的整数，（ii）至少一种选自由式（II）表示的聚合单元的聚合单元：其中，R1表示氢原子等，R2 代表C1-C8烷基，X代表脂环族烃基，和由式（Ⅳ）表示的聚合单元：其中R3表示氢原子等，R4和R5独立地表示氢原子等，R10表示 C 1 -C 6烷基等，和（iii）由式（III）表示的聚合单元：其中R3，R4和R5与上述定义相同，E表示二价烃基，G表示单键等 Z表示羰基等，L r 表示蒽基等，和（B）至少一种酸发生剂。

    CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
    4.
    发明申请
    CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
    化学放大正电阻组合物

    公开(公告)号：US20090004600A1

    公开(公告)日：2009-01-01

    申请号：US12143268

    申请日：2008-06-20

    申请人： Makoto Akita ,  Isao Yoshida ,  Kazuhiko Hashimoto

    发明人： Makoto Akita ,  Isao Yoshida ,  Kazuhiko Hashimoto

    IPC分类号： G03C1/053

    CPC分类号： G03F7/0397 ,  C07C69/00 ,  C07C2603/24 ,  C08F212/14 ,  C08F212/34 ,  C08F220/18 ,  G03F7/0045 ,  G03F7/0046 ,  Y10S430/106

    摘要： A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): wherein R7 represents a hydrogen atom etc., R8 represents a C1-C4 alkyl group, p represents an integer of 1 to 3, and q represents an integer of 0 to 2, (ii) at least one polymerization unit selected from a group consisting of a polymerization unit represented by the formula (II): wherein R1 represents a hydrogen atom etc., R2 represents a C1-C8 alkyl group and ring X represents an alicyclic hydrocarbon group, and a polymerization unit represented by the formula (IV): wherein R3 represents a hydrogen atom etc., R4 and R5 independently represents a hydrogen atom etc., R10 represents a C1-C6 alkyl group etc., and (iii) a polymerization unit represented by the formula (III): wherein R3, R4 and R5 are the same as defined above, E represents a divalent hydrocarbon group, G represents a single bond etc., Z represents a carbonyl group etc. and L represents an anthryl group etc., and (B) at least one acid generator.

    摘要翻译： 一种化学放大正型抗蚀剂组合物，其包含（A）树脂，其包含（i）由式（I）表示的聚合单元：其中R7表示氢原子等，R8表示C1-C4烷基，p表示整数 为1〜3，q为0〜2的整数，（ii）至少一种选自由式（II）表示的聚合单元的聚合单元：其中，R1表示氢原子等，R2 代表C1-C8烷基，X代表脂环族烃基，和由式（Ⅳ）表示的聚合单元：其中R3表示氢原子等，R4和R5独立地表示氢原子等，R10表示 C 1 -C 6烷基等，和（iii）由式（III）表示的聚合单元：其中R3，R4和R5与上述定义相同，E表示二价烃基，G表示单键等 Z表示羰基等，L r 表示蒽基等，和（B）至少一种酸发生剂。

    Chemically amplified positive resist composition
    10.
    发明授权
    Chemically amplified positive resist composition 有权
    化学放大正光刻胶组合物

    公开(公告)号：US08003296B2

    公开(公告)日：2011-08-23

    申请号：US12536386

    申请日：2009-08-05

    申请人： Masahiko Shimada ,  Kazuhiko Hashimoto ,  Junji Shigematsu ,  Takayuki Miyagawa ,  Satoshi Yamamoto

    发明人： Masahiko Shimada ,  Kazuhiko Hashimoto ,  Junji Shigematsu ,  Takayuki Miyagawa ,  Satoshi Yamamoto

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0395 ,  Y10S430/108 ,  Y10S430/111

    摘要： The present invention provides a chemically amplified positive composition comprising: (A) a resin comprising a structural unit having an acid-labile group and being itself insoluble or poorly soluble in an alkali aqueous solution but becoming soluble in an alkali aqueous solution by the action of an acid, (B) a resin comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or —(CH2)k—CO—X4—, k represents an integer of 1 to 4, X1, X2, X3 and X4 each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and a structural unit having a fluorine atom in a side chain, and an acid generator.

    摘要翻译： 本发明提供了一种化学放大阳性组合物，其包含：（A）包含具有酸不稳定基团的结构单元的树脂，其本身不溶于或难溶于碱性水溶液，但通过作用于 酸，（B）包含由式（I）表示的结构单元的树脂：其中R1表示氢原子，卤素原子，C1-C4烷基或C1-C4全氟烷基，Z表示单键 或 - （CH 2）k -CO-X 4 - ，k表示1〜4的整数，X 1，X 2，X 3，X 4各自独立地表示氧原子或硫原子，m表示1〜3的整数，n表示 0〜3的整数，侧链具有氟原子的结构单元和酸发生剂。