公开(公告)号：US20130034421A1

公开(公告)日：2013-02-07

申请号：US13460191

申请日：2012-04-30

申请人： Vincent Sylvester KUIPER ,  Erwin SLOT ,  Marcel Nicolaas Jacobus VAN KERVINCK ,  Guido DE BOER ,  Hendrik Jan DE JONG

发明人： Vincent Sylvester KUIPER ,  Erwin SLOT ,  Marcel Nicolaas Jacobus VAN KERVINCK ,  Guido DE BOER ,  Hendrik Jan DE JONG

IPC分类号： H01L21/677

CPC分类号： G03F7/70733 ,  G03F7/7075 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67745

摘要： A method of processing substrates in a lithography system unit, the lithography system unit comprising at least two substrate preparation units, a load lock unit comprising at least first and second substrate positions, and a substrate handling robot for transferring substrates between the substrate preparation units and the load lock unit. The method comprises providing a sequence of substrates to be exposed to the robot, including an Nth substrate, an N−1th substrate, and an N+1th substrate; transferring the Nth substrate to a first one of the substrate preparation units; clamping the Nth substrate on a first substrate support structure in the first substrate preparation unit to form a clamped Nth substrate; transferring the clamped Nth substrate from the first substrate preparation unit to an unoccupied one of the first and second positions in the load lock unit; and exposing the clamped Nth substrate in the lithography system unit.

公开(公告)号：US20130111485A1

公开(公告)日：2013-05-02

申请号：US13452990

申请日：2012-04-23

申请人： Marcel Nicolaas Jacobus VAN KERVINCK ,  Guido DE BOER

发明人： Marcel Nicolaas Jacobus VAN KERVINCK ,  Guido DE BOER

IPC分类号： G06F9/48

CPC分类号： G06F9/48 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70483 ,  G03F7/70508 ,  G03F7/70525 ,  G03F7/70991 ,  G05B19/41865 ,  G06F9/4881 ,  H01J37/3177

摘要： A clustered substrate processing system comprising one or more lithography elements, each lithography element arranged for independent exposure of substrates according to pattern data. Each lithography element comprises a plurality of lithography subsystems, a control network arranged for communication of control information between the lithography subsystems and at least one element control unit for transmitting commands to and receiving responses from the lithography subsystems. Each lithography element also comprises a cluster front-end for interface to an operator or host system. The front-end is arranged for issuing a process program to the element control unit, the process program comprising a set of predefined commands and associated parameters, each command corresponding to a predefined action or sequence of actions to be performed by one or more of the lithography subsystems, and the parameters further defining how the action or sequence of actions are to be performed.

公开(公告)号：US20130044305A1

公开(公告)日：2013-02-21

申请号：US13460239

申请日：2012-04-30

申请人： Vincent Sylvester KUIPER ,  Erwin SLOT ,  Marcel Nicolaas Jacobus VAN KERVINCK ,  Guido DE BOER ,  Hendrik Jan DE JONG

发明人： Vincent Sylvester KUIPER ,  Erwin SLOT ,  Marcel Nicolaas Jacobus VAN KERVINCK ,  Guido DE BOER ,  Hendrik Jan DE JONG

IPC分类号： G03B27/58

CPC分类号： G03F7/70733 ,  G03F7/7075 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67745

摘要： An apparatus for transferring substrates within a lithography system, the lithography system comprising a substrate preparation unit for clamping a substrate onto a substrate support structure to form a clamped substrate, and an interface with a substrate supply system for receiving unclamped substrates. The apparatus comprises a body provided with a first set of fingers for carrying an unclamped substrate and a second set of fingers for carrying a substrate support structure, and the first set of fingers is located below the second set of fingers, and fingers of the first set of fingers have a different shape than the fingers of the second set of fingers.

公开(公告)号：US20130037730A1

公开(公告)日：2013-02-14

申请号：US13453008

申请日：2012-04-23

申请人： Erwin SLOT ,  Marcel Nicolaas Jacobus VAN KERVINCK ,  Vincent Sylvester KUIPER

发明人： Erwin SLOT ,  Marcel Nicolaas Jacobus VAN KERVINCK ,  Vincent Sylvester KUIPER

IPC分类号： G21K5/00

CPC分类号： G06F9/48 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70483 ,  G03F7/70508 ,  G03F7/70525 ,  G03F7/70991 ,  G05B19/41865 ,  G06F9/4881 ,  H01J37/3177

摘要： The invention relates to a clustered substrate processing system comprising a plurality of lithography elements. Each lithography element is arranged for independent exposure of substrates according to pattern data, and comprises a plurality of lithography subsystems, a control network arranged for communication of control information between the lithography subsystems and at least one element control unit, the element control unit arranged to transmit commands to the lithography subsystems and the lithography subsystems arranged to transmit responses to the element control unit, and a data network arranged for communication of data logging information from the lithography subsystems to at least one data network hub, the lithography subsystems arranged to transmit data logging information to the data network hub and the data hub arranged for receiving and storing the data logging information. The system further comprises a cluster front-end for interface to an operator or host system.

摘要翻译： 本发明涉及一种包括多个光刻元件的聚集基板处理系统。 每个光刻元件被布置成根据图案数据独立地暴露衬底，并且包括多个光刻子系统，布置成用于在光刻子系统和至少一个元件控制单元之间传送控制信息的控制网络，元件控制单元被布置为 向光刻子系统和光刻子系统传送命令以布置成向元件控制单元发送响应;以及数据网络，被布置用于将数据记录信息从光刻子系统传送到至少一个数据网络集线器，光刻子系统被布置为传送数据 将数据记录信息记录到数据网络集线器和布置成用于接收和存储数据记录信息的数据集线器。 该系统还包括用于与操作者或主机系统接口的群集前端。