摘要:
An image generation apparatus provides interpolation and distortion correction. The interpolation and distortion correction may be provided in one or two dimensions. Nonlinear image scan trajectories, such as sinusoidal and bi-sinusoidal trajectories are accommodated. Horizontal and vertical scan positions are determined using a linear pixel clock, and displayed pixel intensities are determined using interpolation techniques.
摘要:
An image generation apparatus provides interpolation and distortion correction. The interpolation and distortion correction may be provided in one or two dimensions. Nonlinear image scan trajectories, such as sinusoidal and bi-sinusoidal trajectories are accommodated. Horizontal and vertical scan positions are determined using a linear pixel clock, and displayed pixel intensities are determined using interpolation techniques.
摘要:
An image generation apparatus provides interpolation and distortion correction. The interpolation and distortion correction may be provided in one or two dimensions. Nonlinear image scan trajectories, such as sinusoidal and bi-sinusoidal trajectories are accommodated. Horizontal and vertical scan positions are determined using a linear pixel clock, and displayed pixel intensities are determined using interpolation techniques.
摘要:
An image generation apparatus provides correction for color offsets. Color offsets may be caused by misalignments in laser diodes or optics assemblies in a laser projector. The offsets may be measured during or after manufacture of the laser projector. An image buffer is responsive to the offset data to translate each color plane separately. The image buffer may include separately addressable portions for each color. Further, variable delay elements on the output of the image buffer may provide color offset correction. Interpolation provides further offset correction.
摘要:
An image generation apparatus provides correction for color offsets. Color offsets may be caused by misalignments in laser diodes or optics assemblies in a laser projector. The offsets may be measured during or after manufacture of the laser projector. An image buffer is responsive to the offset data to translate each color plane separately. The image buffer may include separately addressable portions for each color. Further, variable delay elements on the output of the image buffer may provide color offset correction. Interpolation provides further offset correction.
摘要:
A scanned beam display device scans a beam to paint an image. The beam is scanned in two dimensions and includes at least one sinusoidal component. Phase offsets are introduced to provide different scan trajectories for successive traversals of the image field of view.
摘要:
A scanned beam display device scans a beam to paint an image. The beam is scanned in two dimensions and includes at least one sinusoidal component. Phase offsets are introduced to provide different scan trajectories for successive traversals of the image field of view.
摘要:
An integrated photonics module includes at least one light source and a MEMS scanner coupled to and held in alignment by an optical frame configured for mounting to a host system. According to some embodiments, the integrated photonics module may include a plurality of light sources and a beam combiner coupled to the optical frame. According to some embodiments, the integrated photonics module includes a selective fold mirror configured to direct at least a portion of emitted light toward the MEMS scanner in a normal direction and pass scanned light through to a field of view. The selective fold mirror may use beam polarization to select beam passing and reflection. The integrated photonics module may include a beam rotator such as a quarter-wave plate to convert the polarization of the emitted light to a different polarization adapted for passage through the fold mirror. The integrated photonics module may include one or more light detectors.
摘要:
An integrated photonics module includes at least one light source and a MEMS scanner coupled to and held in alignment by an optical frame configured for mounting to a host system. According to some embodiments, the integrated photonics module may include a plurality of light sources and a beam combiner coupled to the optical frame. According to some embodiments, the integrated photonics module includes a selective fold mirror configured to direct at least a portion of emitted light toward the MEMS scanner in a normal direction and pass scanned light through to a field of view. The selective fold mirror may use beam polarization to select beam passing and reflection. The integrated photonics module may include a beam rotator such as a quarter-wave plate to convert the polarization of the emitted light to a different polarization adapted for passage through the fold mirror. The integrated photonics module may include one or more light detectors.
摘要:
An integrated photonics module includes at least one light source and a MEMS scanner coupled to and held in alignment by an optical frame configured for mounting to a host system. According to some embodiments, the integrated photonics module may include a plurality of light sources and a beam combiner coupled to the optical frame. According to some embodiments, the integrated photonics module includes a selective fold mirror configured to direct at least a portion of emitted light toward the MEMS scanner in a normal direction and pass scanned light through to a field of view. The selective fold mirror may use beam polarization to select beam passing and reflection. The integrated photonics module may include a beam rotator such as a quarter-wave plate to convert the polarization of the emitted light to a different polarization adapted for passage through the fold mirror. The integrated photonics module may include one or more light detectors.