公开(公告)号：US20110008649A1

公开(公告)日：2011-01-13

申请号：US12833410

申请日：2010-07-09

申请人： Masahiko TAMURA ,  Toru Momose ,  Katsuaki Miyatani ,  Tetsuya Nakashima

发明人： Masahiko TAMURA ,  Toru Momose ,  Katsuaki Miyatani ,  Tetsuya Nakashima

IPC分类号： G11B5/73 ,  B24B7/24 ,  B24B1/00 ,  G11B5/84

CPC分类号： G11B5/8404 ,  B24B37/042 ,  B24B37/08 ,  C03C19/00 ,  G11B5/7315

摘要： The present invention relates to a method for manufacturing a glass substrate for information recording medium, the method including: a lapping step of lapping a circular glass plate made of an alkali aluminosilicate glass; and a subsequent cerium oxide polishing step of polishing the circular glass plate with a slurry containing a cerium oxide abrasive, in which a difference (SiO2−Al2O3) obtained by subtracting an Al2O3 content from an SiO2 content in the alkali aluminosilicate glass is 62% by mole or less; and in which the method further includes: subsequently to the cerium oxide polishing step, a cleaning step of cleaning the circular glass plate with a cleaning liquid having a sulfuric acid concentration of 20% by mass or more and 80% by mass or less and a hydrogen peroxide concentration of 1% by mass or more and 10% by mass or less at a liquid temperature of 50° C. or higher and 100° C. or lower, and after the cleaning step, a finish polishing step of polishing a main surface of the circular glass plate with a slurry containing a colloidal silica abrasive.

摘要翻译： 本发明涉及一种用于信息记录介质的玻璃基板的制造方法，该方法包括：研磨由铝硅酸铝玻璃制成的圆形玻璃板的研磨步骤; 以及后续的氧化铈抛光步骤，用含有氧化铈磨料的浆料研磨圆形玻璃板，其中通过从碱性铝硅酸盐玻璃中的SiO 2含量减去Al 2 O 3含量而得到的差异（SiO 2 -Al 2 O 3）为62％ 摩尔或更少; 该方法还包括：随后的氧化铈抛光步骤，用硫酸浓度为20质量％以上且80质量％以下的清洗液清洗圆形玻璃板的清洗工序， 过氧化氢浓度在50℃以上且100℃以下的液温下为1质量％以上且10质量％以下，在清洗工序后，对主体进行研磨的精抛光工序 具有含有胶体二氧化硅研磨剂的浆料的圆形玻璃板的表面。