公开(公告)号：US20130157551A1

公开(公告)日：2013-06-20

申请号：US13819104

申请日：2011-08-18

申请人： Masanori Endo ,  Hajime Nishimura ,  Satoshi Yanagisawa ,  Yukihiro Matsuzaki

发明人： Masanori Endo ,  Hajime Nishimura ,  Satoshi Yanagisawa ,  Yukihiro Matsuzaki

IPC分类号： B24D11/00

摘要： A high performance polishing cloth having a densified surface state with ultrafine fiber bundles uniformly dispersed therein and having excellent smoothness is provided. The polishing cloth comprises a nonwoven fabric formed by entangling the ultrafine fiber bundles formed by bundling ultrafine fibers with an average single fiber diameter of 0.05 to 2.0 μm and a polymeric elastic material, wherein the average size of the surface fiber-napped portions constituted by the aforementioned ultrafine fiber bundles of the aforementioned nonwoven fabric in the width direction of the ultrafine fiber bundles is 50 to 180 μM.

摘要翻译： 提供了具有均匀分散在其中并具有优异平滑度的超细纤维束致密表面状态的高性能抛光布。 抛光布包括通过缠结通过将平均单纤维直径为0.05至2.0μm的超细纤维捆扎而形成的超细纤维束和聚合物弹性材料而形成的无纺布，其中由所述表面纤维起毛部分的平均尺寸 上述非织造布在超细纤维束的宽度方向上的超细纤维束为50〜180μm。

公开(公告)号：US09707663B2

公开(公告)日：2017-07-18

申请号：US14001791

申请日：2012-01-30

申请人： Kuniyasu Shiro ,  Masaharu Wada ,  Hiroyasu Kato ,  Hajime Nishimura ,  Satoshi Yanagisawa ,  Yukihiro Matsuzaki

发明人： Kuniyasu Shiro ,  Masaharu Wada ,  Hiroyasu Kato ,  Hajime Nishimura ,  Satoshi Yanagisawa ,  Yukihiro Matsuzaki

IPC分类号： D06N3/00 ,  D06N3/14 ,  B24B37/24

CPC分类号： B24B37/24 ,  D06N3/0004 ,  D06N3/14 ,  D06N2205/24

摘要： A polishing pad is provided with a compression elastic modulus of 0.17 MPa or more and 0.32 MPa or less produced by preparing a nonwoven fabric formed of bundles of ultrafine fibers with an average monofilament diameter of 3.0 μm or more and 8.0 μm or less, preparing a polishing pad base by impregnating the nonwoven fabric with a polyurethane based elastomer in an amount of 20 mass % or more and 50 mass % or less relative to the mass of the polishing pad base, and laminating the polishing pad base with a porous polyurethane layer containing wet-solidified polyurethane as primary component which has openings with an average opening diameter of 10 μm or more and 90 μm or less in its surface to serve as polishing surface layer.

公开(公告)号：US20130331014A1

公开(公告)日：2013-12-12

申请号：US14001791

申请日：2012-01-30

申请人： Kuniyasu Shiro ,  Masaharu Wada ,  Hiroyasu Kato ,  Hajime Nishimura ,  Satoshi Yanagisawa ,  Yukihiro Matsuzaki

发明人： Kuniyasu Shiro ,  Masaharu Wada ,  Hiroyasu Kato ,  Hajime Nishimura ,  Satoshi Yanagisawa ,  Yukihiro Matsuzaki

IPC分类号： B24B37/24

CPC分类号： B24B37/24 ,  D06N3/0004 ,  D06N3/14 ,  D06N2205/24

摘要： A polishing pad is provided with a compression elastic modulus of 0.17 MPa or more and 0.32 MPa or less produced by preparing a nonwoven fabric formed of bundles of ultrafine fibers with an average monofilament diameter of 3.0 μm or more and 8.0 μm or less, preparing a polishing pad base by impregnating the nonwoven fabric with a polyurethane based elastomer in an amount of 20 mass % or more and 50 mass % or less relative to the mass of the polishing pad base, and laminating the polishing pad base with a porous polyurethane layer containing wet-solidified polyurethane as primary component which has openings with an average opening diameter of 10 μm or more and 90 μm or less in its surface to serve as polishing surface layer.

摘要翻译： 抛光垫具有通过制备由平均单丝直径为3.0μm以上至8.0μm以下的超细纤维束形成的无纺布而制成的0.17MPa以上且0.32MPa以下的压缩弹性模量，制备 通过以相对于研磨垫基材的质量为20质量％以上且50质量％以下的量的聚氨酯系弹性体浸渍无纺布，并且将研磨垫基材与含有 湿固化聚氨酯作为主要成分，其表面的平均开口直径为10μm以上且90μm以下，作为抛光面层。