METHOD OF MARKING A SOLID-STATE MATERIAL, MARKINGS FORMED FROM SUCH METHODS AND SOLID-STATE MATERIALS MARKED ACCORDING TO SUCH A METHOD

    公开(公告)号:US20210146716A1

    公开(公告)日:2021-05-20

    申请号:US16622606

    申请日:2019-02-22

    Abstract: A method of forming a non-optically detectable identifiable marking invisible to the naked eye is formed from plural recesses of multiple levels at an outer surface of an article formed from a solid-state material. The method includes forming plural recesses of multiple levels within a predetermined region of a photoresist applied to an outer surface of an article formed from a solid-state material. The plural recesses are formed by grayscale lithography and the recesses extend at least partially through the photoresist and towards the outer surface of the article formed from a solid-state material. The method also includes applying an etching process such that at least a portion of the outer surface of said article is exposed and etched to form plural etched portions extending into the article from its outer surface and corresponding to plural recesses; wherein said predetermined region of said photoresist defines an identifiable marking to be applied to the outer surface of said article; wherein said plurality of etched portions forms the non-optically identifiable marking on the outer surface of said article.

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