公开(公告)号：US20150029828A1

公开(公告)日：2015-01-29

申请号：US14444918

申请日：2014-07-28

Applicant: Master Dynamic Limited

Inventor： Ying Nan WANG ,  Ho CHING

IPC: G04B17/06

CPC classification number: G04B17/066 ,  G04B17/32 ,  G04B17/325 ,  G04D3/0041 ,  Y10T29/49579

Abstract: A method of producing unitary formed silicon balance spring having an overcoil portion for regulation of a mechanical timepiece, said method including the steps of providing a silicon balance spring having a main body portion, and an outer portion for formation as an overcoil portion, wherein the outer portion extends radially outward from an outermost turn of the main body portion, and wherein said main body portion and said outer portion are integrally formed from a silicon based material and are formed in a co-planar configuration; moving said outer portion in a direction relative to and out of the plane of said main body portion, and in a direction towards over said main body portion and towards the plane of the main body portion; and providing a stress relaxation process to the balance spring so as to relieve internal stresses induced within the balance spring from step (ii); wherein upon movement of said outer portion into the plane of said main body portion, the outer portion is located in an overcoil configuration relative to said main body portion.

Abstract translation: 一种制造具有用于调节机械钟表的上线圈部分的单一成形硅平衡弹簧的方法，所述方法包括以下步骤：提供具有主体部分的硅平衡弹簧和用于形成外壳线圈部分的外部部分，其中， 外部部分从主体部分的最外圈径向向外延伸，并且其中所述主体部分和所述外部部分由硅基材料一体地形成并且形成为共面构造; 在相对于所述主体部分的平面的方向上移动所述外部部分，并沿着朝向所述主体部分的方向朝向主体部分的平面移动; 以及向所述平衡弹簧提供应力松弛过程，以便缓解来自步骤（ii）的所述平衡弹簧内引起的内部应力; 其中，当所述外部部分移动到所述主体部分的平面中时，所述外部部分相对于所述主体部分位于线圈结构中。

公开(公告)号：US20140356638A1

公开(公告)日：2014-12-04

申请号：US14283928

申请日：2014-05-21

Applicant: Master Dynamic Limited

Inventor： Ying Nan WANG ,  Ching Tom KONG

IPC: G04B19/26 ,  G03F7/26 ,  C23C14/35 ,  G03F7/20

CPC classification number: G04B19/268 ,  C23C14/35 ,  G03F7/20 ,  G03F7/26 ,  G04B19/12 ,  G04D3/0092

Abstract: A method of fabricating a component for use in a watch includes a step of depositing a first thin film on a wafer wherein the first thin film is adapted to allow light reflected away from the wafer to be indicative of a first color characteristic. The step of depositing the first thin film is performed by using a plasma-enhanced chemical vapor deposition process or a low pressure chemical vapor deposition process. The method may further include a step of fabricating a second color characteristic, including defining a pattern on the first thin film using photolithography, and, processing a region within a boundary of the pattern so that the region is adapted to allow light reflected away from the wafer to be indicative of the second color characteristic. The step of processing the region within the boundary of the pattern includes depositing a metal or a ceramic material within the boundary of the pattern which is indicative of the second color characteristic. The step of processing the region within the boundary of the pattern may also include depositing a second thin film within the region within the boundary of the pattern.

Abstract translation: 制造用于手表的部件的方法包括在晶片上沉积第一薄膜的步骤，其中第一薄膜适于允许从晶片反射的光指示第一颜色特性。 通过使用等离子体增强化学气相沉积工艺或低压化学气相沉积工艺来进行沉积第一薄膜的步骤。 该方法还可以包括制造第二颜色特性的步骤，包括使用光刻法在第一薄膜上限定图案，以及处理图案边界内的区域，使得该区域适于允许从 晶片指示第二颜色特性。 在图案的边界内处理区域的步骤包括在指示第二颜色特征的图案的边界内沉积金属或陶瓷材料。 在图案的边界内处理区域的步骤还可以包括在图案的边界内的区域内沉积第二薄膜。