公开(公告)号：US6086778A

公开(公告)日：2000-07-11

申请号：US906572

申请日：1997-08-04

Applicant: Maynard Martin

Inventor： Maynard Martin

IPC: C23C16/44 ,  C23C16/54 ,  C23F1/08 ,  B05D1/00 ,  B05B13/00

CPC classification number: C23F1/08 ,  C23C16/4407 ,  C23C16/54

Abstract: A novel modular muffle etch injector assembly for use in a gas blanketed down-flow chemical vapor deposition apparatus of the type having a muffle and a modular gas injector assembly for introducing chemical vapors into a deposition chamber, the muffle being adapted for receiving and supporting the gas injector assembly, wherein deposition material residue collects on a lower surface of the muffle. The etch injector assembly of the present invention comprises an etch chamber having vertical sidewalls, a closed top end and an open bottom end, a supply mechanism for introducing a liquid etchant into the etch chamber, and a sealing device disposed along the open end of the etch chamber for providing a seal between the etch chamber and the lower surface of the muffle to confine the etchant to the etch chamber. The etch injector assembly preferably also includes an exhaust means for removing chemical vapors from the etch chamber. The etch injector assembly is adapted to replace the gas injector assembly within the deposition chamber during maintenance operations for removing the residue from the lower surface of the muffle by introducing the liquid etchant into the etch chamber and on to the lower surface of the muffle.

Abstract translation: 一种用于气体封闭的下流化学气相沉积装置的新型模块化马弗炉蚀刻喷射器组件，其具有用于将化学蒸气引入沉积室的马弗管和模块式气体喷射器组件，马弗管适于接收和支撑 气体注射器组件，其中沉积材料残留物收集在马弗管的下表面上。 本发明的蚀刻喷射器组件包括具有垂直侧壁，封闭顶端和开口底端的蚀刻室，用于将液体蚀刻剂引入蚀刻室的供应机构，以及沿着开口端设置的密封装置 蚀刻室，用于在蚀刻室和马弗管的下表面之间提供密封，以将蚀刻剂限制在蚀刻室中。 蚀刻喷射器组件优选地还包括用于从蚀刻室去除化学蒸汽的排气装置。 蚀刻喷射器组件适于在维护操作期间更换沉积室内的气体喷射器组件，以通过将液体蚀刻剂引入蚀刻室中并在马弗管的下表面上从马弗炉的下表面移除残留物。

公开(公告)号：US06673156B2

公开(公告)日：2004-01-06

申请号：US10264232

申请日：2002-10-01

Applicant: Maynard Martin

Inventor： Maynard Martin

IPC: B05D100

CPC classification number: C23F1/08 ,  C23C16/4407 ,  C23C16/54

Abstract: A novel modular muffle etch injector assembly for use in a gas blanketed down-flow chemical vapor deposition apparatus of the type having a muffle and a modular gas injector assembly for introducing chemical vapors into a deposition chamber, the muffle being adapted for receiving and supporting the gas injector assembly, wherein deposition material residue collects on a lower surface of the muffle. The etch injector assembly of the present invention comprises an etch chamber having vertical sidewalls, a closed top end and an open bottom end, a supply mechanism for introducing a liquid etchant into the etch chamber, and a sealing device disposed along the open end of the etch chamber for providing a seal between the etch chamber and the lower surface of the muffle to confine the etchant to the etch chamber. The etch injector assembly preferably also includes an exhaust means for removing chemical vapors from the etch chamber. The etch injector assembly is adapted to replace the gas injector assembly within the deposition chamber during maintenance operations for removing the residue from the lower surface of the muffle by introducing the liquid etchant into the etch chamber and on to the lower surface of the muffle.

Abstract translation: 一种用于气体封闭的下流化学气相沉积装置的新型模块化马弗炉蚀刻喷射器组件，其具有用于将化学蒸气引入沉积室的马弗管和模块式气体喷射器组件，马弗管适于接收和支撑 气体注射器组件，其中沉积材料残留物收集在马弗管的下表面上。 本发明的蚀刻喷射器组件包括具有垂直侧壁，封闭顶端和开口底端的蚀刻室，用于将液体蚀刻剂引入蚀刻室的供应机构，以及沿着开口端设置的密封装置 蚀刻室，用于在蚀刻室和马弗管的下表面之间提供密封，以将蚀刻剂限制在蚀刻室中。 蚀刻喷射器组件优选地还包括用于从蚀刻室去除化学蒸汽的排气装置。 蚀刻喷射器组件适于在维护操作期间更换沉积室内的气体喷射器组件，以通过将液体蚀刻剂引入蚀刻室中并在马弗管的下表面上从马弗炉的下表面移除残留物。

公开(公告)号：US06918988B2

公开(公告)日：2005-07-19

申请号：US10718740

申请日：2003-11-20

Applicant: Maynard Martin

Inventor： Maynard Martin

IPC: C23C16/44 ,  C23C16/54 ,  C23F1/08 ,  B05D1/00

CPC classification number: C23F1/08 ,  C23C16/4407 ,  C23C16/54

Abstract: A novel modular muffle etch injector assembly for use in a gas blanketed down-flow chemical vapor deposition apparatus of the type having a muffle and a modular gas injector assembly for introducing chemical vapors into a deposition chamber, the muffle being adapted for receiving and supporting the gas injector assembly, wherein deposition material residue collects on a lower surface of the muffle. The etch injector assembly of the present invention comprises an etch chamber having vertical sidewalls, a closed top end and an open bottom end, a supply mechanism for introducing a liquid etchant into the etch chamber, and a sealing device disposed along the open end of the etch chamber for providing a seal between the etch chamber and the lower surface of the muffle to confine the etchant to the etch chamber. The etch injector assembly preferably also includes an exhaust means for removing chemical vapors from the etch chamber. The etch injector assembly is adapted to replace the gas injector assembly within the deposition chamber during maintenance operations for removing the residue from the lower surface of the muffle by introducing the liquid etchant into the etch chamber and on to the lower surface of the muffle.

Abstract translation: 一种用于气体封闭的下流化学气相沉积装置的新型模块化马弗炉蚀刻喷射器组件，其具有用于将化学蒸气引入沉积室的马弗管和模块式气体喷射器组件，马弗管适于接收和支撑 气体注射器组件，其中沉积材料残留物收集在马弗管的下表面上。 本发明的蚀刻喷射器组件包括具有垂直侧壁，封闭顶端和开口底端的蚀刻室，用于将液体蚀刻剂引入蚀刻室的供应机构，以及沿着开口端设置的密封装置 蚀刻室，用于在蚀刻室和马弗管的下表面之间提供密封，以将蚀刻剂限制在蚀刻室中。 蚀刻喷射器组件优选地还包括用于从蚀刻室去除化学蒸汽的排气装置。 蚀刻喷射器组件适于在维护操作期间更换沉积室内的气体喷射器组件，以通过将液体蚀刻剂引入蚀刻室中并在马弗管的下表面上从马弗炉的下表面移除残留物。

公开(公告)号：US5688359A

公开(公告)日：1997-11-18

申请号：US504839

申请日：1995-07-20

Applicant: Maynard Martin

Inventor： Maynard Martin

IPC: C23C16/44 ,  C23C16/54 ,  C23F1/08 ,  C23C16/00

CPC classification number: C23F1/08 ,  C23C16/4407 ,  C23C16/54

Abstract: A novel modular muffle etch injector assembly for use in a gas blanketed down-flow chemical vapor deposition apparatus of the type having a muffle and a modular gas injector assembly for introducing chemical vapors into a deposition chamber, the muffle being adapted for receiving and supporting the gas injector assembly, wherein deposition material residue collects on a lower surface of the muffle. The etch injector assembly of the present invention comprises an etch chamber having vertical sidewalls, a closed top end and an open bottom end, a supply mechanism for introducing a liquid etchant into the etch chamber, and a sealing device disposed along the open end of the etch chamber for providing a seal between the etch chamber and the lower surface of the muffle to confine the etchant to the etch chamber. The etch injector assembly preferably also includes an exhaust means for removing chemical vapors from the etch chamber. The etch injector assembly is adapted to replace the gas injector assembly within the deposition chamber during maintenance operations for removing the residue from the lower surface of the muffle by introducing the liquid etchant into the etch chamber and on to the lower surface of the muffle.

Abstract translation: 一种用于气体封闭的下流化学气相沉积装置的新型模块化马弗炉蚀刻喷射器组件，其具有用于将化学蒸气引入沉积室的马弗管和模块式气体喷射器组件，马弗管适于接收和支撑 气体注射器组件，其中沉积材料残留物收集在马弗管的下表面上。 本发明的蚀刻喷射器组件包括具有垂直侧壁，封闭顶端和开口底端的蚀刻室，用于将液体蚀刻剂引入蚀刻室的供应机构，以及沿着开口端设置的密封装置 蚀刻室，用于在蚀刻室和马弗管的下表面之间提供密封，以将蚀刻剂限制在蚀刻室中。 蚀刻喷射器组件优选地还包括用于从蚀刻室去除化学蒸汽的排气装置。 蚀刻喷射器组件适于在维护操作期间更换沉积室内的气体喷射器组件，以通过将液体蚀刻剂引入蚀刻室中并在马弗管的下表面上从马弗炉的下表面移除残留物。