Electrode construction for implantable medical electrical leads
    2.
    发明授权
    Electrode construction for implantable medical electrical leads 有权
    用于植入式医疗电线的电极结构

    公开(公告)号:US08862245B2

    公开(公告)日:2014-10-14

    申请号:US13664782

    申请日:2012-10-31

    Inventor: Gregory A Boser

    CPC classification number: A61N1/3752

    Abstract: An implantable electrode for electrical stimulation of a body, for example, being a component of an implantable medical electrical lead, is preferably in the form of a coiled conductor wire, wherein the wire is formed by a tantalum (Ta) core directly overlaid with a platinum-iridium (Pt—Ir) cladding. When a maximum thickness of the Pt—Ir cladding defines a cladded zone between an outer, exposed surface of the electrode and the Ta core, a surface of the Ta core encroaches into the cladded zone by no more than approximately 50 micro-inches. The tantalum core may be cold worked to improve surface quality or formed from a sintered and, preferably, grain stabilized tantalum.

    Abstract translation: 用于电刺激身体的可植入电极,例如作为可植入医疗电引线的部件,优选为线圈状导体线的形式,其中线由直接覆盖有 铂 - 铱(Pt-Ir)包层。 当Pt-Ir包层的最大厚度限定在电极的外部暴露表面和Ta核之间的包层区域时,Ta核的表面侵入包层区域不超过约50微英寸。 钽芯可以被冷加工以改善表面质量或由烧结的,优选的晶粒稳定的钽形成。

    Electrode construction for implantable medical electrical leads

    公开(公告)号:US10232167B2

    公开(公告)日:2019-03-19

    申请号:US14521958

    申请日:2014-10-23

    Abstract: An implantable electrode for electrical stimulation of a body, for example, being a component of an implantable medical electrical lead, is preferably in the form of a coiled conductor wire, wherein the wire is formed by a tantalum (Ta) core directly overlaid with a platinum-iridium (Pt—Ir) cladding. When a maximum thickness of the Pt—Ir cladding defines a cladded zone between an outer, exposed surface of the electrode and the Ta core, a surface of the Ta core encroaches into the cladded zone by no more than approximately 50 micro-inches. The tantalum core may be cold worked to improve surface quality or formed from a sintered and, preferably, grain stabilized tantalum.

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