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公开(公告)号:US20240197404A1
公开(公告)日:2024-06-20
申请号:US18066640
申请日:2022-12-15
发明人: Saba PASHA
CPC分类号: A61B34/20 , A61B8/0841 , A61B8/4209 , A61B8/4245 , A61B8/4477 , A61B8/461 , A61B8/54 , A61B8/56 , A61B2034/2051 , A61B2034/2063
摘要: Disclosed is a system to plan and position an implant in a subject. The planned position may be based upon various features and structures identified in a group of subjects for a current subject. The implant may then be positioned in a selected position including a relative position and orientation of one or more electrodes on the implant which may be identified as an optimal position for the selected current subject.