专利检索 ap:("Michael Gerhard" OR "Nils Dieckmann" OR "Christine Sieler" OR "Marcus Zehetbauer" OR "Martin Schriever" OR "Gerd Reisinger") AND inv:"Christine Sieler" 第 1 页

1.

发明授权
Process for the decontamination of microlithographic projection exposure devices 失效
标题翻译：微光刻投影曝光装置去污的方法

公开(公告)号：US06936825B2

公开(公告)日：2005-08-30

申请号：US09754841

申请日：2001-01-03

申请人： Michael Gerhard , Nils Dieckmann , Christine Sieler , Marcus Zehetbauer , Martin Schriever , Gerd Reisinger

发明人： Michael Gerhard , Nils Dieckmann , Christine Sieler , Marcus Zehetbauer , Martin Schriever , Gerd Reisinger

IPC分类号： B08B7/00 , G03F7/20 , H01L21/027 , G01N21/01 , G01N21/51

CPC分类号： G03F7/70883 , B08B7/0057 , G03F7/7005 , G03F7/70925

摘要： UV light and a fluid are used in a process for the decontamination of microlithographic projection exposure devices with optical elements or portions thereof, in particular of the surfaces of optical elements. A second UV light source is directed for decontamination, in intervals between exposures, toward at least a portion of the optical elements.

摘要翻译： UV光和流体用于具有光学元件或其部分，特别是光学元件的表面的微光刻投影曝光装置的净化过程中。第二UV光源被引导用于在曝光之间的间隔中朝向至少一部分光学元件的净化。