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公开(公告)号:US06218671B1
公开(公告)日:2001-04-17
申请号:US09144275
申请日:1998-08-31
IPC分类号: H01J37244
CPC分类号: H01J37/304 , H01J37/244 , H01J2237/2823 , H01J2237/30433 , H01J2237/3175
摘要: A small pinhole aperture and a scintillator are used to observe resolution in a charged particle beam system which is particularly applicable to electron beam projection devices in which the beam is several orders of magnitude larger than the desired resolution and minimum feature size to be produced. A pattern having a feature which is of comparable size to the desired resolution to be observed is scanned across the aperture in two dimensions and a synchronized display of measured light output from the scintillator allows real-time observation of the effects of correction adjustments on the resolution of the system. In this manner, a rough adjustment to near optimum corrections can be obtained over the deflection field in a much reduced number of iterations.
摘要翻译: 使用小针孔和闪烁体来观察带电粒子束系统中的分辨率,其特别适用于电子束投影装置,其中光束比要产生的期望分辨率和最小特征尺寸大几个数量级。 具有与待观察的期望分辨率相当尺寸的特征的图案在二维空间上扫描,并且来自闪烁体的测量光输出的同步显示允许实时观察校正调整对分辨率的影响 的系统。 以这种方式,可以在大大减少的迭代次数的偏转场上获得对近似最佳校正的粗略调整。