Structure Model description and use for scatterometry-based semiconductor manufacturing process metrology
    1.
    发明申请
    Structure Model description and use for scatterometry-based semiconductor manufacturing process metrology 审中-公开
    结构模型描述和用于基于散射的半导体制造过程计量学

    公开(公告)号:US20090306941A1

    公开(公告)日:2009-12-10

    申请号:US12227387

    申请日:2007-05-14

    IPC分类号: G06F17/50

    CPC分类号: G01N23/20

    摘要: A method includes accessing a structure model defining a cross-sectional profile of a structure on a sample. The cross-sectional profile is at least partially defined using a set of blocks. Each of the blocks includes a number of vertices. One or more of the vertices are expressed using one or more algebraic relationships between a number of parameters corresponding to the structure. Information is evaluated from the structure model to produce expected metrology data for a scatterometry-based optical metrology. The expected metrology data is suitable for use for determining one or more of the number of parameters corresponding to the structure. Apparatus are also disclosed.

    摘要翻译: 一种方法包括访问定义样本上的结构的横截面轮廓的结构模型。 使用一组块至少部分地限定横截面轮廓。 每个块包括多个顶点。 一个或多个顶点使用与该结构相对应的多个参数之间的一个或多个代数关系来表示。 从结构模型评估信息,以产生用于基于散射法的光学计量学的预期计量数据。 期望的测量数据适用于确定与该结构相对应的参数数量中的一个或多个。 还公开了装置。

    Simultaneous multiple angle/multiple wavelength ellipsometer and method
    2.
    发明授权
    Simultaneous multiple angle/multiple wavelength ellipsometer and method 失效
    同时多角度/多波长椭偏仪及方法

    公开(公告)号:US5166752A

    公开(公告)日:1992-11-24

    申请号:US640100

    申请日:1990-01-11

    IPC分类号: G01N21/21

    CPC分类号: G01N21/211

    摘要: The ellipsometer and method involve directing polarized light for interaction with an optical system under study at different angles of incidence from a single beam of light and detecting the light interacted with the optical system by reflection and/or transmission for each of a plurality of different angles of incidence. The simultaneous illumination of the optical system under study at a whole range of angles of incidence from a single beam of light and the collection a large multiplicity of data from the different angles detected can be accomplished rapidly and easily and with accuracy without scanning and with only one ellipsometer. A lens is used to focus the incoming light to provide the range of different angles of incidence. The range of angles is at least one or two degrees and preferably thirty degrees or more. A second lens refocuses the interacted light to a linear, multi-element detector array which extends in the plane of the incidence. Each of the detector elements detects a narrow range of angles of incidence within the relatively wider range of angles of incidence of the illuminating beam. If the incident illuminating rays are polychromatic and a wavelength dispersing element acts on the reflected rays each detector element of a square array detects a narrow range of wavelengths and angles of incidence.

    摘要翻译: 椭偏仪和方法涉及引导偏振光以与来自单个光束的不同入射角的研究中的光学系统相互作用,并且通过用于多个不同角度中的每一个的反射和/或透射来检测与光学系统相互作用的光 的发病率。 在单光束的整个入射角范围内同时照射研究的光学系统,并且从检测到的不同角度收集大量数据可以快速而容易地并且准确地实现,而无需扫描和仅使用 一个椭偏仪。 使用透镜来聚焦入射光以提供不同入射角的范围。 角度范围为至少一度或二度,优选三十度以上。 第二透镜将相互作用的光重新聚焦到在入射平面中延伸的线性多元素检测器阵列。 每个检测器元件在照明光束的相对较宽的入射角范围内检测入射角的窄范围。 如果入射照明光线是多色的并且波长分散元件作用在反射光线上,则每个方阵的检测器元件检测波长和入射角的窄范围。