摘要:
A method includes accessing a structure model defining a cross-sectional profile of a structure on a sample. The cross-sectional profile is at least partially defined using a set of blocks. Each of the blocks includes a number of vertices. One or more of the vertices are expressed using one or more algebraic relationships between a number of parameters corresponding to the structure. Information is evaluated from the structure model to produce expected metrology data for a scatterometry-based optical metrology. The expected metrology data is suitable for use for determining one or more of the number of parameters corresponding to the structure. Apparatus are also disclosed.
摘要:
The ellipsometer and method involve directing polarized light for interaction with an optical system under study at different angles of incidence from a single beam of light and detecting the light interacted with the optical system by reflection and/or transmission for each of a plurality of different angles of incidence. The simultaneous illumination of the optical system under study at a whole range of angles of incidence from a single beam of light and the collection a large multiplicity of data from the different angles detected can be accomplished rapidly and easily and with accuracy without scanning and with only one ellipsometer. A lens is used to focus the incoming light to provide the range of different angles of incidence. The range of angles is at least one or two degrees and preferably thirty degrees or more. A second lens refocuses the interacted light to a linear, multi-element detector array which extends in the plane of the incidence. Each of the detector elements detects a narrow range of angles of incidence within the relatively wider range of angles of incidence of the illuminating beam. If the incident illuminating rays are polychromatic and a wavelength dispersing element acts on the reflected rays each detector element of a square array detects a narrow range of wavelengths and angles of incidence.