Semiconductor on insulator devices
    1.
    发明授权
    Semiconductor on insulator devices 失效
    半导体绝缘体器件

    公开(公告)号:US5925915A

    公开(公告)日:1999-07-20

    申请号:US251011

    申请日:1994-05-31

    IPC分类号: H01L27/12 H01L27/01 H01L29/76

    CPC分类号: H01L27/1203

    摘要: A pair of complementary MOSFET's having regions of a common conductivity type separating the source and drain regions thereof which are provided on a support structure formed of an electrical insulating layer on a semiconductor material base. MOSFET's has a gate oxide layer on which is provided a gate semiconductor structure, with these structures each being of a common conductivity type and located across the gate oxide layers from the corresponding common conductivity type region.

    摘要翻译: 一对互补MOSFET,其具有分开其源极和漏极区域的共同导电类型的区域,其设置在由半导体材料基底上的电绝缘层形成的支撑结构上。 MOSFET具有栅极氧化层,在栅极氧化物层上设置栅极半导体结构,这些结构各自具有公共导电类型,并且从相应的公共导电类型区域跨越栅极氧化物层。