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公开(公告)号：US20120325775A1
公开(公告)日：2012-12-27
申请号：US13530569
申请日：2012-06-22
IPC分类号： B29C35/08
CPC分类号： B81C1/00373 , B33Y10/00 , B33Y80/00 , B81B2203/0392 , B81B2207/07 , B81C2201/0187 , G03F7/0037
摘要： A method for producing three-dimensional microstructures in which a source material is applied on a substrate, with a property changing by exposure with electromagnetic radiation. A three-dimensional source structure is written via spatially-resolving exposure in the source material, the source material is removed except for the source structure, and the source structure is molded with a target material, from which the microstructure to be produced is made. Here, a shell structure is provided surrounding the microstructure to be produced, with the source structure being created as the shell structure or the shell structure is produced using the source structure, and subsequently the target material is inserted into the shell structure.
摘要翻译： 一种用于产生三维微结构的方法，其中源材料施加在基底上，具有通过用电磁辐射曝光而改变的性质。 通过在源材料中的空间分辨曝光来写入三维源结构，除了源结构之外，除去源材料，并且用目标材料模制源结构，由其制造待生产的微结构。 这里，围绕要生产的微观结构提供壳结构，其中源结构被创建为壳结构，或者使用源结构产生壳结构，并且随后将靶材插入壳结构中。
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公开(公告)号：US08986563B2
公开(公告)日：2015-03-24
申请号：US13530569
申请日：2012-06-22
CPC分类号： B81C1/00373 , B33Y10/00 , B33Y80/00 , B81B2203/0392 , B81B2207/07 , B81C2201/0187 , G03F7/0037
摘要： A method for producing three-dimensional microstructures in which a source material is applied on a substrate, with a property changing by exposure with electromagnetic radiation. A three-dimensional source structure is written via spatially-resolving exposure in the source material, the source material is removed except for the source structure, and the source structure is molded with a target material, from which the microstructure to be produced is made. Here, a shell structure is provided surrounding the microstructure to be produced, with the source structure being created as the shell structure or the shell structure is produced using the source structure, and subsequently the target material is inserted into the shell structure.
摘要翻译： 一种用于产生三维微结构的方法，其中源材料施加在基底上，具有通过用电磁辐射曝光而改变的性质。 通过在源材料中的空间分辨曝光来写入三维源结构，除了源结构之外，除去源材料，并且用目标材料模制源结构，由此制造待生产的微结构。 这里，围绕要生产的微观结构提供壳结构，其中源结构被创建为壳结构，或者使用源结构产生壳结构，并且随后将靶材插入壳结构中。
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公开(公告)号：US08202437B2
公开(公告)日：2012-06-19
申请号：US12227559
申请日：2007-05-16
IPC分类号： B29D11/00
CPC分类号： G02B6/1225 , B82Y20/00 , G02B6/13
摘要： The invention relates to a process for producing a photonic crystal which consists of a material of high refractive index, comprising the following process steps: a) providing a polymer structure with crosslinked air pores, whose surface has empty interstitial sites, b) applying a homogeneous, isotropic thin coating material to the surface of the polymer structure, c) introducing a high-index material, d) opening up a route to the polymer or to the coating material applied in step b), e) removing the layer applied in step b), f) removing the polymeric structure.
摘要翻译： 本发明涉及一种制备由高折射率材料组成的光子晶体的方法，包括以下工艺步骤：a）提供具有交联的空气孔的聚合物结构，其表面具有空的间隙位置，b）施加均匀的 ，各向同性薄涂层材料到聚合物结构的表面，c）引入高折射率材料，d）打开到步骤b）中施加的聚合物或涂层材料的路线，e）去除步骤中施加的层 b），f）除去聚合物结构。
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公开(公告)号：US20090166325A1
公开(公告)日：2009-07-02
申请号：US12227559
申请日：2007-05-16
CPC分类号： G02B6/1225 , B82Y20/00 , G02B6/13
摘要： The invention relates to a process for producing a photonic crystal which consists of a material of high refractive index, comprising the following process steps: a) providing a polymer structure with crosslinked air pores, whose surface has empty interstitial sites, b) applying a homogeneous, isotropic thin coating material to the surface of the polymer structure, c) introducing a high-index material, d) opening up a route to the polymer or to the coating material applied in step b), e) removing the layer applied in step b), f) removing the polymeric structure.
摘要翻译： 本发明涉及一种制备由高折射率材料组成的光子晶体的方法，包括以下工艺步骤：a）提供具有交联的空气孔的聚合物结构，其表面具有空的间隙位置，b）施加均匀的 ，各向同性薄涂层材料到聚合物结构的表面，c）引入高折射率材料，d）打开到步骤b）中施加的聚合物或涂层材料的路线，e）去除步骤中施加的层 b），f）除去聚合物结构。
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