公开(公告)号：US20040239006A1

公开(公告)日：2004-12-02

申请号：US10763594

申请日：2004-01-22

Applicant: Microfabrica Inc.

Inventor： Harry H. Hong

IPC: B29C035/08

CPC classification number: B81C1/0046 ,  C25D1/003 ,  C25D5/022 ,  C25D5/024

Abstract: Embodiments of the present invention are directed to silicone based compositions having enhanced UV absorption, methods for making such compositions, methods of making electrochemical fabrication contact masks using such compositions, contact masks themselves, and electrochemical fabrication methods for using such masks. The enhanced UV absorption of the silicone allows it to be patterned by laser ablation. Some compositions include moieties having one or more aromatic rings attached to silicone backbones and molecules having ring structured polyimides with pluralities of double bond functional groups. Other compositions also include molecules having aromatic ring backbones and pluralities of double bond formation groups.

Abstract translation: 本发明的实施方案涉及具有增强的UV吸收性的硅氧烷基组合物，制备这种组合物的方法，使用这种组合物制备电化学制造接触掩模的方法，接触掩模本身以及使用这种掩模的电化学制造方法。 硅树脂的增强的紫外吸收允许其通过激光烧蚀进行图案化。 一些组合物包括具有连接到硅氧烷主链的一个或多个芳环的部分和具有多个双键官能团的具有环结构的聚酰亚胺的分子。 其它组合物还包括具有芳环主链和多个双键形成基团的分子。