公开(公告)号：US20140026925A1

公开(公告)日：2014-01-30

申请号：US14048562

申请日：2013-10-08

Applicant: Micron Technology, Inc.

Inventor： Eugene P. Marsh ,  David R. Atwell

IPC: C23C16/44

CPC classification number: C23C16/4405 ,  C23C16/4402 ,  C23C16/4481 ,  C23C16/52 ,  Y10T137/0357

Abstract: System and method for operating a material deposition system are disclosed. In one embodiment, the method can include periodically injecting a precursor into a vaporizer through an injector at the vaporizer, vaporizing the precursor in the vaporizer and supplying the vaporized precursor to a reaction chamber in fluid communication with the vaporizer, and shutting down the vaporizer and the reaction chamber after a period of time. The method can also include conducting maintenance of the injector at the vaporizer by using a vapor solvent rinse.

Abstract translation: 公开了用于操作材料沉积系统的系统和方法。 在一个实施方案中，该方法可以包括通过蒸发器处的注射器周期性地将前体注入蒸发器中，蒸发蒸发器中的前体并将蒸发的前体供应到与蒸发器流体连通的反应室，并且关闭蒸发器和 反应室经过一段时间。 该方法还可以包括通过使用蒸气溶剂冲洗在蒸发器处进行喷射器的维护。