摘要:
A method for inkjet printing using an ink comprised of an acicular pigment and a solvent in an inkjet printer to print on a recording medium wherein the inkjet printer has an ink reservoir and a print head. The method comprises obtaining the ink comprised of the acicular pigment and the solvent wherein the ink has a first viscosity, filling the ink reservoir of the inkjet printer with the ink, flowing the ink from the ink reservoir to the print head of the inkjet printer, and jetting the ink from the print head of the inkjet printer and onto the recording medium, wherein the ink has a second viscosity upon exiting the print head. An ink formulation(s) comprised of an acicular pigment and a solvent for use in printing images with an inkjet printer. An ink cartridge and an inkjet printing system compatible with an ink comprised of an acicular pigment.
摘要:
A mechanical stage cementing tool that includes a mechanical opening and closing seat sleeve and a pin sub. The mechanical stage cementing tool may be converted to a hydraulic stage cementing tool by inserting a hydraulic tube assembly into the mechanical opening and closing seat sleeve at a hydraulic modification area and by adding a hydraulic seat to the pin sub. The stage cementing tool has a running-in-hole position, an open position, and a closed position.
摘要:
A method for controlling the implantation of ions into a target. An ion source chamber having a filament for causing evolution of the ions to be implanted is provided. An ion source reactant gas is provided for providing a source of the ion species to be implanted. A counteracting gas is provided to counter the chemical transport from or to the filament depending on the reaction between the ion source gas ions and the filament and to compensate for the reaction. The ion source reactant is introduced into the ion source chamber. Parameters regarding electrical or physical characteristics of the filament are measured. The counteracting gas is introduced based upon the measured parameters, wherein the counteracting gas forms ions to compensate for removal or deposition of material on the filament. The ions to be implanted are extracted from ion source chamber and directed to the target.
摘要:
In a plasma or RIE etching tool using a uniquely designed annulus around a wafer supporting pedestal, it has been found that the introduction of one or more gases in the region immediately adjacent the annulus controls the amount of etching of features in that region in the surface of the wafer mounted on the pedestal. By so controlling the amount of gas in this region, the slope of the walls of the etched features can be also controlled.
摘要:
A curved pipe is connected to a support surface with a pair of U-bolt assemblies. One assembly supports the vertical portion of the pipe and the other supports the horizontal portion. Each of the U-bolt assemblies has a U-bolt, a clamp bracket, and a support bracket. The support bracket is connected to a support surface. One or both of the assemblies may also include a pair of spade bolts and a hinge for spacing the support plate away from the support surface.
摘要:
A U-bolt is placed around a pipe and bolted to a clamp bracket, and the clamp bracket is bolted to a support plate. A pair of spade bolts are attached to the support plate and a hinge is connected between the ends of the spade bolts. A pair of screw connect the hinge to a support surface. The clamp bracket can be pivoted relative to the support plate, and the hinge can be pivoted relative to the support plate, to allow the pipe to be secured to a support surface at any angle.