Photosensitive resin composition for forming organic insulating film and device using the same
    1.
    发明授权
    Photosensitive resin composition for forming organic insulating film and device using the same 有权
    用于形成有机绝缘膜的感光树脂组合物及使用其的装置

    公开(公告)号:US07691915B2

    公开(公告)日:2010-04-06

    申请号:US11924753

    申请日:2007-10-26

    IPC分类号: G03F7/004 G03F7/028

    CPC分类号: G03F7/0233

    摘要: Disclosed is a photosensitive resin composition. The composition comprises [A] an alkali-soluble resin, [B] a photoactive compound and [C] a solvent. The alkali-soluble resin is a copolymer including at least one structural unit with an aziridine group. The composition exhibits good storage stability, high sensitivity, high UV transmittance, high residual film ratio, improved coating uniformity and excellent pattern-forming properties. Further disclosed is an organic insulating film formed using the composition. The organic insulating film has excellent resistance to solvents and chemicals.

    摘要翻译: 公开了感光性树脂组合物。 该组合物包含[A]碱溶性树脂,[B]光活性化合物和[C]溶剂。 碱溶性树脂是包含至少一个具有氮丙啶基的结构单元的共聚物。 该组合物具有良好的储存稳定性,高灵敏度,高的紫外线透过率,高的残留膜比,改进的涂布均匀性和优异的图案形成性能。 进一步公开了使用该组合物形成的有机绝缘膜。 有机绝缘膜具有优异的耐溶剂性和耐化学性。