公开(公告)号：US5378256A

公开(公告)日：1995-01-03

申请号：US78424

申请日：1993-06-16

申请人： Mino Green ,  R. R. A. Syms ,  Andrew S. Holmes ,  Ken Ueki ,  Hisaharu Yanagawa

发明人： Mino Green ,  R. R. A. Syms ,  Andrew S. Holmes ,  Ken Ueki ,  Hisaharu Yanagawa

IPC分类号： G02B6/13 ,  C03B8/02 ,  C03B19/12 ,  C03B20/00 ,  C03C1/00 ,  G02B6/132 ,  C03C25/02 ,  C03B37/023

CPC分类号： C03C1/006 ,  G02B6/132

摘要： This invention describes a method of manufacturing silica waveguide optical components in which silica glass films are laminated on a substrate by repeating a unit operation in which a sol material, a precursor of glass particles, is coated and then the coated layer is heated in an oxygen atmosphere. wherein the heating temperature is controlled in such a manner that the radius of curvature of warping of the substrate is 2 m or more after the coated layer is heated, thereby preventing cracking in the formed silica glass film and/or peeling of the coated layer. At locations where a difference in height is present, at least when sol is coated first time, the thickness of the coated layer is less than that of one of the subsequent coated layers.

摘要翻译： 本发明描述了一种制造二氧化硅波导光学部件的方法，其中通过重复其中涂覆溶胶材料，玻璃颗粒的前体，然后将涂层在氧气中加热的单元操作将二氧化硅玻璃膜层压在基板上 大气层。 其特征在于，加热温度被控制为使得在涂层被加热后基材的翘曲曲率半径为2μm以上，从而防止形成的石英玻璃膜的裂纹和/或涂层的剥离。 在存在高差的位置处，至少当第一次涂布溶胶时，涂层的厚度小于其后的涂布层的厚度。