公开(公告)号：US5849467A

公开(公告)日：1998-12-15

申请号：US788442

申请日：1997-01-28

申请人： Mitsuru Sato ,  Naomi Nagatsuka ,  Koichi Nagasawa ,  Hutoshi Shimai ,  Kouji Harada

发明人： Mitsuru Sato ,  Naomi Nagatsuka ,  Koichi Nagasawa ,  Hutoshi Shimai ,  Kouji Harada

IPC分类号： G03F7/42 ,  G03F7/16 ,  G03F7/26 ,  H01L21/027 ,  H01L21/304 ,  H01L21/308 ,  G03C5/00

CPC分类号： G03F7/168

摘要： The invention proposes an improved method for the pre-treatment of a photoresist layer formed on a substrate surface prior to pattern-wise exposure of the photoresist layer to actinic rays, in which extraneous portions of the resist layer formed by overspreading of the photoresist solution as in the marginal zone of the patterning area and on the peripheral and back surfaces of the substrate, by dissolving away with a cleaning solution. In contrast to the conventional cleaning solutions consisting entirely or mainly of an organic solvent capable of dissolving the photoresist composition, the cleaning solution used in the inventive method is an aqueous alkaline solution containing a water-soluble alkaline compound dissolved in an aqueous medium consisting of water and a limited amount of a water-miscible organic solvent such as monohydric alcohols, alkyleneglycol monoalkyl ethers and aprotic solvents. The cleaning solution may optionally contain an anti-corrosion agent.

摘要翻译： 本发明提出了一种用于在将光致抗蚀剂层图案化地曝光于光化射线之前，在基板表面上形成的光致抗蚀剂层的预处理的改进方法，其中通过将光致抗蚀剂溶液的过度扩展形成的抗蚀剂层的外部部分 在图案化区域的边缘区域和衬底的周边和背面上，通过用清洁溶液溶解。 与完全或主要由可溶解光致抗蚀剂组合物的有机溶剂组成的常规清洁溶液相反，本发明方法中使用的清洗溶液是含有溶于水中的水溶性碱性化合物的碱性水溶液， 和有限量的水混溶性有机溶剂如一元醇，亚烷基二醇单烷基醚和非质子溶剂。 清洁溶液可以任选地含有防腐蚀剂。