STAND WITH PANNING BASE
    6.
    发明申请
    STAND WITH PANNING BASE 有权
    站在舞台上

    公开(公告)号:US20110075350A1

    公开(公告)日:2011-03-31

    申请号:US12958871

    申请日:2010-12-02

    IPC分类号: G06F1/16 F16M11/38 F16M11/10

    摘要: A stand for supporting an object. The stand includes a base, a support member coupled to the base, and a movement mechanism adapted to allow the object to move along a range of travel relative to the base. The base includes a planar surface for resting on a support surface. The planar surface includes a first portion and a second portion. The first portion includes a pad for providing frictional resistance between the base and the support surface on which the base is placed. The second portion includes at least first and second wheels, for rotating the base about the pad such that the object is rotated about the pad when the base is rotated about the pad.

    摘要翻译: 支持对象的支架。 支架包括基座,联接到基座的支撑构件和适于允许物体相对于基座的行进范围移动的移动机构。 基座包括用于搁置在支撑表面上的平面。 平面包括第一部分和第二部分。 第一部分包括用于在基座和其上放置基座的支撑表面之间提供摩擦阻力的垫。 第二部分至少包括第一和第二轮,用于使基部围绕衬垫旋转,使得当基座围绕衬垫旋转时物体围绕衬垫旋转。

    Stand with panning base
    8.
    发明授权
    Stand with panning base 有权
    站在平底锅

    公开(公告)号:US08262047B2

    公开(公告)日:2012-09-11

    申请号:US12958871

    申请日:2010-12-02

    IPC分类号: A47G29/00

    摘要: A stand for supporting an object. The stand includes a base, a support member coupled to the base, and a movement mechanism adapted to allow the object to move along a range of travel relative to the base. The base includes a planar surface for resting on a support surface. The planar surface includes a first portion and a second portion. The first portion includes a pad for providing frictional resistance between the base and the support surface on which the base is placed. The second portion includes at least first and second wheels, for rotating the base about the pad such that the object is rotated about the pad when the base is rotated about the pad.

    摘要翻译: 支持对象的支架。 支架包括基座,联接到基座的支撑构件和适于允许物体相对于基座的行进范围移动的移动机构。 基座包括用于搁置在支撑表面上的平面。 平面包括第一部分和第二部分。 第一部分包括用于在基座和其上放置基座的支撑表面之间提供摩擦阻力的垫。 第二部分至少包括第一和第二轮,用于使基部围绕衬垫旋转,使得当基座围绕衬垫旋转时物体围绕衬垫旋转。