Reticle discerning device, exposure equipment comprising the same and exposure method
    1.
    发明申请
    Reticle discerning device, exposure equipment comprising the same and exposure method 失效
    掩模版识别装置,包含曝光方法的曝光设备

    公开(公告)号:US20070152167A1

    公开(公告)日:2007-07-05

    申请号:US11501076

    申请日:2006-08-09

    申请人: Myeong-Seok Lee

    发明人: Myeong-Seok Lee

    摘要: A reticle discerning device includes a memory in which images of to-be-illuminated patterns of a plurality of reticles are stored as reference pattern images, respectively, a detection unit comprising an optical image sensor, and a processing unit connected to the memory and to the detection unit. The processing unit is operative to compare the reference pattern images with images detected by the optical image sensor of the detection unit. The reticle discerning device is used in exposure equipment having a stocker in which the reticles are stocked, an exposure apparatus, and a reticle transfer robot that transfers a selected one of the reticles from the stocker to the exposure apparatus. The detection unit captures an image of the pattern of the selected reticle and uses the image to discern the reticle and ensure that the correct reticle is transferred to the exposure apparatus. Specifically, the processing unit compares the captured image to one of the reference images stored in the memory of the reticle discerning device.

    摘要翻译: 掩模版识别装置包括存储器,其中分别存储多个光罩图案的照明图案的图像作为参考图案图像;检测单元,包括光学图像传感器和连接到存储器的处理单元, 检测单元。 处理单元可操作以将参考图案图像与由检测单元的光学图像传感器检测到的图像进行比较。 掩模版识别装置用于具有储存器的存放器的曝光设备中,掩模版被放置在其中,曝光设备和掩模版传送机器人将选定的一个掩模版从储盘器传送到曝光设备。 检测单元捕获所选择的掩模版的图案的图像,并使用图像来辨别光罩,并确保正确的掩模版被转印到曝光装置。 具体地,处理单元将捕获的图像与存储在标线仪识别装置的存储器中的参考图像中的一个进行比较。

    Semiconductor device fabrication equipment and method of using the same
    2.
    发明申请
    Semiconductor device fabrication equipment and method of using the same 审中-公开
    半导体器件制造设备及其使用方法

    公开(公告)号:US20070166030A1

    公开(公告)日:2007-07-19

    申请号:US11511276

    申请日:2006-08-29

    申请人: Myeong-Seok Lee

    发明人: Myeong-Seok Lee

    IPC分类号: G03D5/00

    摘要: Semiconductor device fabrication equipment and a method of using the same minimize the total time that a wafer spends being transferred through the equipment and the number of times the wafer is transferred between respective parts of the equipment. The semiconductor fabrication equipment includes a first apparatus used for performing a first process on a wafer, a second apparatus linked in-line to the first apparatus and used for performing a second process consecutive to the first process with respect to the fabrication of a semiconductor device from the wafer, and a speed regulator connected to the first and second apparatuses. The speed regulator detects durations of the first and second processes, respectively, compares the durations, and makes a determination as to whether the duration of the first process is shorter than the duration of the second process. The speed regulator is also configured to adjust the speed at which the first process is executed when the duration of the first process is shorter than the duration of the second process.

    摘要翻译: 半导体器件制造设备和使用该半导体器件制造设备的方法使得晶片在设备中传输的总时间最小化,并且晶片在设备的相应部分之间传送的次数最小化。 半导体制造设备包括用于在晶片上执行第一工艺的第一设备,与第一设备成一直线连接的第二设备,并且用于与半导体器件的制造相关的第一工艺连续执行第二工艺 并且连接到第一和第二装置的速度调节器。 速度调节器分别检测第一和第二进程的持续时间,比较持续时间,并且确定第一进程的持续时间是否短于第二进程的持续时间。 速度调节器还被配置为当第一处理的持续时间短于第二处理的持续时间时,调整执行第一处理的速度。

    Reticle discerning device, exposure equipment comprising the same and exposure method
    3.
    发明授权
    Reticle discerning device, exposure equipment comprising the same and exposure method 失效
    掩模版识别装置,包含曝光方法的曝光设备

    公开(公告)号:US07689027B2

    公开(公告)日:2010-03-30

    申请号:US11501076

    申请日:2006-08-09

    申请人: Myeong-Seok Lee

    发明人: Myeong-Seok Lee

    IPC分类号: G06K9/62

    摘要: A reticle discerning device includes a memory in which images of to-be-illuminated patterns of a plurality of reticles are stored as reference pattern images, respectively, a detection unit comprising an optical image sensor, and a processing unit connected to the memory and to the detection unit. The processing unit is operative to compare the reference pattern images with images detected by the optical image sensor of the detection unit. The reticle discerning device is used in exposure equipment having a stocker in which the reticles are stocked, an exposure apparatus, and a reticle transfer robot that transfers a selected one of the reticles from the stocker to the exposure apparatus. The detection unit captures an image of the pattern of the selected reticle and uses the image to discern the reticle and ensure that the correct reticle is transferred to the exposure apparatus. Specifically, the processing unit compares the captured image to one of the reference images stored in the memory of the reticle discerning device.

    摘要翻译: 掩模版识别装置包括存储器,其中分别存储多个光罩图案的照明图案的图像作为参考图案图像;检测单元,包括光学图像传感器和连接到存储器的处理单元, 检测单元。 处理单元可操作以将参考图案图像与由检测单元的光学图像传感器检测到的图像进行比较。 掩模版识别装置用于具有储存器的存放器的曝光设备中,掩模版被放置在其中,曝光设备和掩模版传送机器人将所选择的一个掩模版从储料器传送到曝光设备。 检测单元捕获所选择的掩模版的图案的图像,并使用图像来辨别光罩,并确保正确的掩模版被转印到曝光装置。 具体地,处理单元将捕获的图像与存储在标线仪识别装置的存储器中的参考图像中的一个进行比较。