公开(公告)号：US20180327661A1

公开(公告)日：2018-11-15

申请号：US15975811

申请日：2018-05-10

Applicant: NANOSYS, INC.

Inventor： David OLMEIJER ,  Anh DUONG ,  Austin SMITH ,  Kao SAECHAO

IPC: C09K11/02 ,  C08L83/08

CPC classification number: C09K11/025 ,  C08L83/08 ,  C08L2203/20 ,  C08L2205/025 ,  C08L2205/03 ,  C08L2205/08 ,  C09K11/02

Abstract: The present invention provides quantum dot compositions and methods of producing quantum dot compositions. The quantum dot compositions comprise a population of quantum dots, a siloxane polymer, an emulsification additive, and an organic resin. The present invention also provides quantum dot films comprising a quantum dot layer and methods of making quantum dot films.