公开(公告)号：US09783881B2

公开(公告)日：2017-10-10

申请号：US14715618

申请日：2015-05-19

Applicant: NATIONAL CHUNG-SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Shih-Chang Liang ,  Wei-Chieh Huang ,  Chao-Nan Wei ,  Cuo-Yo Ni ,  Hui-Yun Bor

IPC: C23C16/00 ,  C23C14/24 ,  C23C14/06

CPC classification number: C23C14/243 ,  C23C14/0623

Abstract: A linear evaporation apparatus includes a thermal insulation chamber, and crucibles, evaporation material heaters and a mixing chamber installed in the thermal insulation chamber. The mixing chamber includes a flow limiting and adjusting layer, a flow channel adjusting member, a mixed layer and a linear evaporation layer. The flow limiting and adjusting layer is a rectangular sheet with flow limit holes corresponsive to the crucibles respectively; the flow channel adjusting member is an interconnected structure having at least one flow inlet corresponsive to some of the flow limit holes and at least one flow outlet, and the mixed layer is a substantially I-shaped sheet structure, and the linear evaporation layer is a rectangular sheet having a linear source evaporation opening tapered from both ends to the middle, so as to improve the uniformity of the thin film and the utilization of the evaporation materials.

公开(公告)号：US09574264B2

公开(公告)日：2017-02-21

申请号：US14716882

申请日：2015-05-20

Applicant: NATIONAL CHUNG-SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Shih-Chang Liang ,  Wei-Chieh Huang ,  Chao-Nan Wei ,  Cuo-Yo Ni ,  Hui-Yun Bor

IPC: C23C16/448 ,  C23C14/24

CPC classification number: C23C14/24 ,  C23C14/243

Abstract: In a method for evaporation depositing uniform thin films, a film is deposited on a substrate of a vacuum environment while maintaining a constant deposition rate. A cover is installed on a wall of the evaporation vessel. When the evaporation material is heated to an evaporation state and the interior of the evaporation vessel reaches a first vapor saturation pressure, the vapor of the evaporation material flows towards a pressure stabilizing chamber. When the pressure stabilizing chamber reaches a second vapor saturation pressure which is smaller than the first vapor saturation pressure, the vacuum environment has a vacuum background pressure which is smaller than the second vapor saturation pressure, so that the evaporation material vapor flows from the pressure stabilizing chamber towards the vacuum environment at constant rate due to the pressure difference, so as to evaporate the substrate.

Abstract translation: 在用于蒸发沉积均匀薄膜的方法中，将膜沉积在真空环境的基板上，同时保持恒定的沉积速率。 一个盖子安装在蒸发容器的墙壁上。 当蒸发材料被加热到蒸发状态并且蒸发容器的内部达到第一蒸气饱和压力时，蒸发材料的蒸气朝向压力稳定室流动。 当压力稳定室达到小于第一蒸汽饱和压力的第二蒸气饱和压力时，真空环境的真空背景压力小于第二蒸汽饱和压力，使得蒸发材料蒸汽从压力稳定 由于压力差，以恒定速率朝向真空环境室，以便使基板蒸发。