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公开(公告)号:US11322634B2
公开(公告)日:2022-05-03
申请号:US16311845
申请日:2017-06-21
发明人: Xiaojing Hao , Fangyang Liu , Jialiang Huang , Chang Yan , Kaiwen Sun , Martin Andrew Green
IPC分类号: H01L31/0749 , H01L31/032 , H01L31/0296 , H01L31/0392 , H01L31/18 , H01L21/02
摘要: A method for forming a photovoltaic device comprising the steps of: providing a first conductive material on a substrate; depositing a continuous layer of a dielectric material less than 10 nm thick on the first conductive material; annealing the first conductive material and the layer of dielectric material; forming a chalcogenide light-absorbing material on the layer of dielectric material; and depositing a second material on the light-absorbing material such that the second material is electrically coupled to the light-absorbing material; wherein the first conductive material and the dielectric material are selected such that, during the step of annealing, a portion of the first conductive material undergoes a chemical reaction to form: a layer of a metal chalcogenide material at the interface between first conductive material and the dielectric material; and a plurality of openings in the layer of dielectric material; the openings being such to allow electrical coupling between the light-absorbing material and the layer of a metal chalcogenide material. Additionally contemplated is a photovoltaic device formed by this method.