公开(公告)号：US20230367230A1

公开(公告)日：2023-11-16

申请号：US18361066

申请日：2023-07-28

Applicant: NIKON CORPORATION

Inventor： Koichi MURAKAMI ,  Koutarou TAKIGAMI ,  Tetsuya ABE

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/70491 ,  G03F7/70116 ,  G03F7/70625 ,  G03F7/2008

Abstract: An exposure apparatus includes: light source that emits exposure light; exposure pattern forming apparatus including a plurality of exposure elements and disposed on an optical path of at least part of exposure light; and control unit electrically connected to exposure pattern forming apparatus, in which control unit controls whether workpiece is irradiated with exposure light via each of exposure elements by switching each of exposure elements to a first or second state, and integrates exposure amount in predetermined region of scheduled exposure region by sequentially irradiating predetermined region with light of part of exposure light via a first exposure element in first state among plurality of exposure elements and light of part of exposure light via second exposure element in the first state different from the first exposure element among the plurality of exposure elements in accordance with a relative movement of the workpiece and the exposure pattern forming apparatus.