公开(公告)号：US20230021209A1

公开(公告)日：2023-01-19

申请号：US17804599

申请日：2022-05-30

Applicant: NOVA MEASURING INSTRUMENTS INC.

Inventor： Charles LARSON ,  Kavita SHAH ,  Wei T LEE

IPC: G01N23/2273 ,  H01L21/67 ,  C23C16/52 ,  C23C16/24 ,  C23C16/455 ,  C23C16/06

Abstract: XPS spectra are used to analyze and monitor various steps in the selective deposition process. A goodness of passivation value is derived to analyze and quantify the quality of the passivation step. A selectivity figure of merit value is derived to analyze and quantify the selectivity of the deposition process, especially for selective deposition in the presence of passivation. A ratio of the selectivity figure of merit to maximum selectivity value can also be used to characterize and monitor the deposition process.

公开(公告)号：US20240044825A1

公开(公告)日：2024-02-08

申请号：US18337397

申请日：2023-06-19

Applicant: NOVA MEASURING INSTRUMENTS INC.

Inventor： Charles LARSON ,  Kavita SHAH ,  Wei T. LEE

IPC: G01N23/2273 ,  H01L21/67 ,  C23C16/52 ,  C23C16/24 ,  C23C16/455 ,  C23C16/06

CPC classification number: G01N23/2273 ,  H01L21/67253 ,  C23C16/52 ,  C23C16/24 ,  C23C16/45529 ,  C23C16/06

Abstract: XPS spectra are used to analyze and monitor various steps in the selective deposition process. A goodness of passivation value is derived to analyze and quantify the quality of the passivation step. A selectivity figure of merit value is derived to analyze and quantify the selectivity of the deposition process, especially for selective deposition in the presence of passivation. A ratio of the selectivity figure of merit to maximum selectivity value can also be used to characterize and monitor the deposition process.