公开(公告)号：US10534275B2

公开(公告)日：2020-01-14

申请号：US15739250

申请日：2016-06-22

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Cornel Bozdog ,  Aron Cepler ,  Paul Isbester

IPC: G03F7/20 ,  G01N21/956 ,  G01N21/21 ,  H01L21/66 ,  H01L21/8234

Abstract: A method and system are presented for use in controlling a multiple patterning process of n patterning stages subsequently applied to a sample to produce a target pattern thereon. The method comprises: providing intermediate measured data indicative of an optical response of the sample after being patterned by m-th patterning stage, 1≤m