Optical metrology for in-situ measurements

    公开(公告)号:US09915624B2

    公开(公告)日:2018-03-13

    申请号:US15385495

    申请日:2016-12-20

    Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.

    Optical metrology for in-situ measurements
    3.
    发明授权
    Optical metrology for in-situ measurements 有权
    用于原位测量的光学测量

    公开(公告)号:US09528946B2

    公开(公告)日:2016-12-27

    申请号:US14422190

    申请日:2013-08-15

    Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.

    Abstract translation: 提出了一种方法和系统,用于控制应用于具有不同层叠叠层区域的图案化结构的工艺。 该方法包括:在预定处理时间内顺序地接收指示正在处理的结构的光学响应的​​测量数据,并产生随时间测量的相应的数据片段序列; 以及分析和处理所述数据段的序列并确定所述结构的至少一个主要参数。 分析和处理包括:处理所述数据片段的一部分并获得指示所述结构的一个或多个参数的数据; 利用表示所述结构的所述一个或多个参数的所述数据,以及描述所述结构的光学响应与所述结构的一个或多个参数之间的关系的最优化模型数据; 利用优化的模型数据来处理测量数据段的序列的至少一部分,以及确定表征应用于结构的所述过程的结构的至少一个参数,以及生成指示其的数据。

    Method and system for determining strain distribution in a sample

    公开(公告)号:US10209206B2

    公开(公告)日:2019-02-19

    申请号:US14903629

    申请日:2014-07-08

    Abstract: A control system is presented for use in measuring one or more parameters of a sample. The control system comprises an input utility and a processor utility. The input utility is configured for receiving input data including first data comprising X-ray Diffraction or High-Resolution X-ray Diffraction (XRD) response data of the sample indicative of a material distribution in the sample, and second data comprising optical response data of the sample to incident light indicative of at least a geometry of the sample. The processor utility is configured and operable for processing and analyzing one of the first and second data for optimizing the other one of the first and second data, and utilizing the optimized data for determining said one or more parameters of the sample including a strain distribution in the sample.

    OPTICAL METROLOGY FOR IN-SITU MEASUREMENTS
    5.
    发明申请
    OPTICAL METROLOGY FOR IN-SITU MEASUREMENTS 有权
    用于实地测量的光学计量学

    公开(公告)号:US20150226680A1

    公开(公告)日:2015-08-13

    申请号:US14422190

    申请日:2013-08-15

    Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.

    Abstract translation: 提出了一种方法和系统,用于控制应用于具有不同层叠叠层区域的图案化结构的工艺。 该方法包括:在预定处理时间内顺序地接收指示正在处理的结构的光学响应的​​测量数据,并产生随时间测量的相应的数据片段序列; 以及分析和处理所述数据段的序列并确定所述结构的至少一个主要参数。 分析和处理包括:处理所述数据片段的一部分并获得指示所述结构的一个或多个参数的数据; 利用表示所述结构的所述一个或多个参数的所述数据,以及描述所述结构的光学响应与所述结构的一个或多个参数之间的关系的最优化模型数据; 利用优化的模型数据来处理测量数据段的序列的至少一部分,以及确定表征应用于结构的所述过程的结构的至少一个参数,以及生成表示其的数据。

    Measurement system and method for measuring in thin films

    公开(公告)号:US10030971B2

    公开(公告)日:2018-07-24

    申请号:US15228772

    申请日:2016-08-04

    Abstract: A measurement method and system are presented for in-line measurements of one or more parameters of thin films in structures progressing on a production line. First measured data and second measured data are provided from multiple measurements sites on the thin film being measured, wherein the first measured data corresponds to first type measurements from a first selected set of a relatively small number of the measurement sites, and the second measured data corresponds to second type optical measurements from a second set of significantly higher number of the measurements sites. The first measured data is processed for determining at least one value of at least one parameter of the thin film in each of the measurement sites of said first set. Such at least one parameter value is utilized for interpreting the second measured data, thereby obtaining data indicative of distribution of values of said at least one parameter within said second set of measurement sites.

    Scatterometry method and system
    7.
    发明授权

    公开(公告)号:US10302414B2

    公开(公告)日:2019-05-28

    申请号:US14852897

    申请日:2015-09-14

    Abstract: A method and system are presented for use in model-based optical measurements in patterned structures. The method comprises: selecting an optimal optical model for interpretation of optical measured data indicative of optical response of the structure under measurements. The selection of the optimal optical model comprises: creating a complete optical model with floating parameters defining multiple configurations of said complete model including one or more model configurations describing an optical response of the structure under measurements, utilizing the complete model for predicting a reference optical response from the structure and generating corresponding virtual reference data, and using the virtual reference data for selecting the optimal optical model for interpretation of the optical measured data.

    Optical metrology for in-situ measurements

    公开(公告)号:US10197506B2

    公开(公告)日:2019-02-05

    申请号:US15915613

    申请日:2018-03-08

    Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.

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