DEVICE AND METHOD FOR PROCESSING MATERIAL BY MEANS OF LASER RADIATION

    公开(公告)号:US20220258279A1

    公开(公告)日:2022-08-18

    申请号:US17628551

    申请日:2020-07-20

    IPC分类号: B23K26/0622 B23K26/082

    摘要: The invention relates to a method for processing material, in particular for modifying material and/or material properties, by means of laser radiation, comprising the following steps: a) generating a multiplicity of laser pulses (L); b) controlling the point of impact of the laser pulses (L) on a workpiece (100) to be processed, in particular deflecting the laser pulses (L) and/or moving the workpiece (100) to be processed, such that the laser pulses (L) are guided along a predetermined trajectory (Z) on the workpiece (100) to be processed. According to the invention, —a pulse-to-pulse time interval (Δt) between the individual laser pulses (L) generated and/or—a pulse energy (Pi) of the laser pulses (L) and/or—a beam diameter (D) of the laser pulses (D) and/or—the predetermined trajectory (Z) is/are specifically subjected to noise.

    METHOD FOR SCANNING FIELD CORRECTION AT LEAST OF A LASER SCANNER DEVICE, LASER SCANNER DEVICE, SCATTER PATTERN ELEMENT, SCATTER PATTERN HOLDING DEVICE AND SCANNING FIELD CORRECTION SYSTEM

    公开(公告)号:US20240231081A9

    公开(公告)日:2024-07-11

    申请号:US18276945

    申请日:2022-02-08

    IPC分类号: G02B27/00 G02B5/02 G02B26/10

    摘要: The invention relates to a method for scanning field correction at least of a laser scanner device (300), wherein the method comprises the following steps: —providing a scatter pattern element (30) on a processing plane (11), wherein the scatter pattern element (30) comprises at least one scatter region (31) which is arranged in a scatter pattern (M); —passing over or scanning at least one part of the scatter pattern element (30) on the processing plane (11) by means of a laser beam (12) of the at least one laser scanner device (300) along scanner coordinates (x, y, z), wherein the laser beam passes through at least one window (20), preferably protective glass, between a deflection unit (10) and the processing plane (11); —detecting scatter radiation (13) which can be generated by scattering and/or reflection of the laser beam (12) when passing over or scanning the at least one scatter region (31); —creating a contour diagram (K) by correlating the detected scatter radiation (13) with the scanner coordinates (x, y, z); —comparing the contour diagram (K) with a reference image of the scatter pattern (M) and determining a deviation of the contour diagram (K) from the reference image of the scatter pattern (M); —calculating a calibration function for calibrated control of the deflection unit (10) on the basis of the determined deviation.

    METHOD FOR SCANNING FIELD CORRECTION AT LEAST OF A LASER SCANNER DEVICE, LASER SCANNER DEVICE, SCATTER PATTERN ELEMENT, SCATTER PATTERN HOLDING DEVICE AND SCANNING FIELD CORRECTION SYSTEM

    公开(公告)号:US20240134188A1

    公开(公告)日:2024-04-25

    申请号:US18276945

    申请日:2022-02-08

    IPC分类号: G02B27/00 G02B5/02 G02B26/10

    摘要: The invention relates to a method for scanning field correction at least of a laser scanner device (300), wherein the method comprises the following steps: —providing a scatter pattern element (30) on a processing plane (11), wherein the scatter pattern element (30) comprises at least one scatter region (31) which is arranged in a scatter pattern (M); —passing over or scanning at least one part of the scatter pattern element (30) on the processing plane (11) by means of a laser beam (12) of the at least one laser scanner device (300) along scanner coordinates (x, y, z), wherein the laser beam passes through at least one window (20), preferably protective glass, between a deflection unit (10) and the processing plane (11); —detecting scatter radiation (13) which can be generated by scattering and/or reflection of the laser beam (12) when passing over or scanning the at least one scatter region (31); —creating a contour diagram (K) by correlating the detected scatter radiation (13) with the scanner coordinates (x, y, z); —comparing the contour diagram (K) with a reference image of the scatter pattern (M) and determining a deviation of the contour diagram (K) from the reference image of the scatter pattern (M); —calculating a calibration function for calibrated control of the deflection unit (10) on the basis of the determined deviation.