公开(公告)号：US20180137948A1

公开(公告)日：2018-05-17

申请号：US15576116

申请日：2016-07-20

Applicant: NTT Advanced Technology Corporation

Inventor： Satoshi ICHIMARU ,  Masatoshi HATAYAMA ,  Masaharu NISHIKINO ,  Masahiko ISHINO

IPC: G21K1/06 ,  G03F7/20

Abstract: To suppress the breakage of a mirror for reflecting high-intensity EUV light, an EUV multilayer mirror presenting a Bragg diffraction effect is formed by a pile of a plurality of heavy-element layers (102) and a plurality of light-element layers (103) disposed on a substrate (101), wherein the light-element layers and the heavy-element layers are alternately deposited. The heavy-element layers (102) contain niobium as a main component, and the light-element layers (103) contain silicon as a main component. For example, the heavy-element layers (102) made of niobium and the light-element layers (103) made of silicon are alternately deposited on the substrate (101) made of single-crystal silicon.