Electron beam exposure system
    1.
    发明授权
    Electron beam exposure system 失效
    电子束曝光系统

    公开(公告)号:US4853870A

    公开(公告)日:1989-08-01

    申请号:US54782

    申请日:1987-05-27

    摘要: In an electron beam exposure system controlled by a computer, the system includes: an electron optical device for generating electron beams and irradiating the beams to a sample on a stage through a plurality of electron lens, a main deflection coil, and sub deflection electrodes, to form predetermined circuit patterns on the sample. The system also includes a position control device controlling the driving of the stage based on a stage position coordinate designated by the computer, detecting an actual stage position coordinate, and calculating an error value between the designated stage position coordinate and the actual stage position coordinate, the error value being divided into two components of an upper bits portion having an relatively large error value and a lower bits portion having a relatively small error value, and a deflection control device controlling the direction of the electron beams based on the main pattern data corrected by the upper bits portion and the sub pattern data corrected by the lower bits portion, and based on selected main and sub wait times determined by exposure and non-exposure timings.

    摘要翻译: 在由计算机控制的电子束曝光系统中,该系统包括:用于产生电子束并通过多个电子透镜,主偏转线圈和副偏转电极将光束照射到载物台上的样品的电子光学装置, 以在样品上形成预定的电路图案。 该系统还包括:基于由计算机指定的舞台位置坐标来控制舞台的驾驶的位置控制装置,检测实际舞台位置坐标,以及计算指定舞台位置坐标与实际舞台位置坐标之间的误差值, 误差值被分成具有相对较大误差值的较高位部分和具有相对较小误差值的较低位部分的两个分量,以及基于校正的主图案数据控制电子束方向的偏转控制装置 通过由较低位部分校正的较高比特部分和子图形数据,并且基于由曝光和非曝光定时确定的选择的主等待时间和次等待时间。