公开(公告)号：US10020165B2

公开(公告)日：2018-07-10

申请号：US15278963

申请日：2016-09-28

申请人： NuFlare Technology, Inc.

发明人： Hiroshi Matsumoto

IPC分类号： H01J37/04 ,  H01J37/317 ,  H01J37/304

CPC分类号： H01J37/304 ,  H01J37/3177 ,  H01J2237/24514 ,  H01J2237/31766 ,  H01J2237/31769 ,  H01J2237/31774

摘要： A multi charged particle beam writing method includes calculating an offset dose to irradiate all the small regions by multiplying one beam dose equivalent to a maximum irradiation time of multi-beams of each pass in multiple writing by a maximum number of defective beams being always ON to irradiate one of the small regions; calculating an incident dose, in addition to the offset dose, for each of the small regions; and performing multiple writing, using multi-beams including a defective beam being always ON, such that a beam of a total dose, between the incident dose and the offset dose, irradiates a corresponding small region for each small region, while switching a beam for each pass of the multiple writing, and controlling an irradiation time equivalent to the offset dose by a common blanking mechanism collectively blanking-controlling the multi-beams.

公开(公告)号：US09805907B2

公开(公告)日：2017-10-31

申请号：US15002121

申请日：2016-01-20

申请人： NuFlare Technology, Inc.

发明人： Hiroshi Matsumoto

IPC分类号： H01J37/147 ,  H01J37/317 ,  H01J37/302 ,  H01J37/06 ,  H01J37/20 ,  G11B9/10

CPC分类号： H01J37/1472 ,  G11B9/10 ,  H01J37/06 ,  H01J37/20 ,  H01J37/3023 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/30483 ,  H01J2237/31762 ,  H01J2237/31766

摘要： A multi charged particle beam writing method includes emitting each corresponding beam in an “on” state while starting and continuing tracking control, shifting a writing position by beam deflection of the multi beams, in addition to tracking control, while continuing tracking control, emitting each corresponding beam in the next “on” state to the next writing position having been shifted while continuing tracking control, and returning the tracking position by resetting tracking control, after emitting each next corresponding beam to the next writing position having been shifted at least once, wherein writing of a predetermined region is completed by repeating the number of preset times a group of performing emitting, shifting, emitting, and returning, wherein the tracking time from start to reset of tracking control in at least one of the repeated groups is longer than the others.

公开(公告)号：US09336993B2

公开(公告)日：2016-05-10

申请号：US14191337

申请日：2014-02-26

申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

发明人： Tsung-Hsin Yu

IPC分类号： H01J3/14 ,  H01J37/317 ,  H01J37/24 ,  H01J37/147 ,  H01J37/20

CPC分类号： H01J37/3174 ,  G03F7/203 ,  G03F7/70291 ,  G03F7/70508 ,  H01J37/147 ,  H01J37/20 ,  H01J37/24 ,  H01J2237/20221 ,  H01J2237/31766

摘要： A method of lithography including providing a first mirror array and a second mirror array of a digital pattern generator (DPG); the second mirror array is offset from the first mirror array in a first direction. A first data piece and a second data piece associated with an IC device, are received by the DPG. The first and second data piece each defines a state of a pixel of the DPG. The first data piece is provided to a first pixel of the DPG. The second data piece is also provided to the first pixel of the DPG. A first point on a photosensitive layer on a target substrate is exposed. The first point is defined by the first data piece and the second data piece. The target substrate moved in a second direction, perpendicular to the first direction to expose a second point.

摘要翻译： 一种光刻方法，包括提供数字图案发生器（DPG）的第一反射镜阵列和第二反射镜阵列; 第二反射镜阵列在第一方向上偏离第一反射镜阵列。 与IC设备相关联的第一数据段和第二数据段由DPG接收。 第一和第二数据段各自定义DPG的像素的状态。 将第一数据片提供给DPG的第一像素。 第二数据段也被提供给DPG的第一个像素。 曝光目标基板上感光层上的第一点。 第一点由第一数据段和第二数据段定义。 目标衬底沿与第一方向垂直的第二方向移动以暴露第二点。

公开(公告)号：US20150243479A1

公开(公告)日：2015-08-27

申请号：US14191337

申请日：2014-02-26

申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

发明人： Tsung-Hsin Yu

IPC分类号： H01J37/317 ,  H01J37/147 ,  H01J37/20 ,  H01J37/24

CPC分类号： H01J37/3174 ,  G03F7/203 ,  G03F7/70291 ,  G03F7/70508 ,  H01J37/147 ,  H01J37/20 ,  H01J37/24 ,  H01J2237/20221 ,  H01J2237/31766

摘要： A method of lithography including providing a first mirror array and a second mirror array of a digital pattern generator (DPG); the second mirror array is offset from the first mirror array in a first direction. A first data piece and a second data piece associated with an IC device, are received by the DPG. The first and second data piece each defines a state of a pixel of the DPG. The first data piece is provided to a first pixel of the DPG. The second data piece is also provided to the first pixel of the DPG. A first point on a photosensitive layer on a target substrate is exposed. The first point is defined by the first data piece and the second data piece. The target substrate moved in a second direction, perpendicular to the first direction to expose a second point.

摘要翻译： 一种光刻方法，包括提供数字图案发生器（DPG）的第一反射镜阵列和第二反射镜阵列; 第二反射镜阵列在第一方向上偏离第一反射镜阵列。 与IC设备相关联的第一数据段和第二数据段由DPG接收。 第一和第二数据段各自定义DPG的像素的状态。 将第一数据片提供给DPG的第一像素。 第二数据段也被提供给DPG的第一个像素。 曝光目标基板上感光层上的第一点。 第一点由第一数据段和第二数据段定义。 目标衬底沿与第一方向垂直的第二方向移动以暴露第二点。

公开(公告)号：US20150131075A1

公开(公告)日：2015-05-14

申请号：US14527233

申请日：2014-10-29

申请人： CANON KABUSHIKI KAISHA

发明人： Tatsuro KATO ,  Tomoyuki MORITA

IPC分类号： H01J37/30 ,  H01J37/20

CPC分类号： H01J37/3177 ,  H01J2237/202 ,  H01J2237/31754 ,  H01J2237/31766 ,  H01J2237/31774

摘要： A drawing apparatus includes: a blanker; a deflector; a stage configured to hold the substrate and to be movable; and a controller configured to control the deflector and the stage so as to perform drawing by scanning the charged particle beam on the substrate by causing the deflector to deflect the charged particle beam in a first direction and moving the stage in a second direction. The controller is configured to cause the stage moving in the second direction to move in the first direction based on a pattern to be drawn and to control a scan width of the charged particle beam in the first direction by the deflector based on a moving amount of the stage in the first direction and the pattern.

摘要翻译： 绘图装置包括：消音器; 导流板 被配置为保持基板并且可移动的台架; 以及控制器，其被配置为控制所述偏转器和所述平台，以便通过使所述偏转器沿第一方向偏转所述带电粒子束并沿所述第二方向移动所述平台来对所述基板上的带电粒子束进行扫描来进行绘图。 所述控制器被配置为使得所述载物台沿所述第二方向移动，基于待绘制的图案在所述第一方向上移动，并且通过所述偏转器基于所述第一方向的移动量控制所述带电粒子束在所述第一方向上的扫描宽度 第一个方向的阶段和模式。

公开(公告)号：US20150129779A1

公开(公告)日：2015-05-14

申请号：US14528192

申请日：2014-10-30

申请人： CANON KABUSHIKI KAISHA

发明人： Tomoyuki Morita ,  Kazuya Kikuchi

IPC分类号： H01J37/20 ,  H01J37/30 ,  G21K5/10

CPC分类号： H01J37/3177 ,  H01J2237/30483 ,  H01J2237/31761 ,  H01J2237/31766

摘要： The present invention provides a drawing apparatus which performs drawing on a substrate with a charged particle beam, the apparatus comprising a deflector configured to scan the charged particle beam on the substrate, a stage configured to hold the substrate and be movable, and a controller configured to control main-scan by the deflector and sub-scan by movement of the stage, wherein the controller is configured to control a width of the main-scan based on a width of a target drawing region on the substrate in a direction of the main-scan.

摘要翻译： 本发明提供了一种利用带电粒子束在基板上进行绘图的绘图装置，该装置包括：构造成扫描基片上的带电粒子束的偏转器，被配置为保持基板并可移动的台，以及控制器配置 通过偏转器控制主扫描和通过台的移动进行副扫描，其中控制器被配置为基于主基板上的目标绘图区域的宽度在主要方向上控制主扫描的宽度 - 扫

公开(公告)号：US20140187056A1

公开(公告)日：2014-07-03

申请号：US14199535

申请日：2014-03-06

申请人： NuFlare Technology, Inc.

发明人： Ryoichi YOSHIKAWA ,  Munehiro Ogasawara

IPC分类号： H01L21/263 ,  H01J37/317

CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/31764 ,  H01J2237/31766 ,  H01L21/263 ,  H01L21/2633 ,  H01L21/3085

摘要： In accordance with one aspect of this invention, a multi charged particle beam writing apparatus includes an aperture member, in which a plurality of openings are formed, configured to form multi-beams by making portions of the charged particle beam pass through the plurality of openings; a plurality of blankers configured to perform blanking-deflect regarding beams corresponding to the multi-beams; a writing processing control unit configured to control writing processing with a plurality of beams having passed through different openings among the plurality of openings being irradiated on the target object at a predetermined control grid interval; and a dose controlling unit configured to variably control a dose of a beam associated with deviation according to a deviation amount when an interval between the plurality of beams irradiated is deviated from the control grid interval.

摘要翻译： 根据本发明的一个方面，一种多带电粒子束写入装置，包括：孔部件，其中形成有多个开口，构成为通过使带电粒子束的部分通过多个开口而形成多光束; ; 多个阻挡器，被配置为对与所述多光束对应的光束执行消隐偏转; 写入处理控制单元，被配置为以预定的控制网格间隔以多个已经穿过所述多个开口中的不同开口的光束来对所述目标物体照射的所述写入处理进行控制; 以及剂量控制单元，被配置为当所述多个照射的光束之间的间隔偏离所述控制网格间隔时，根据偏差量可变地控制与偏差相关联的光束的剂量。

公开(公告)号：US08618516B2

公开(公告)日：2013-12-31

申请号：US13294380

申请日：2011-11-11

申请人： Hirohito Ito

发明人： Hirohito Ito

IPC分类号： H01J37/147

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/3177 ,  H01J2237/304 ,  H01J2237/31766

摘要： A charged-particle beam exposure apparatus which includes a deflector that deflects a charged-particle beam, and a stage mechanism that drives a substrate, and draws a pattern on the substrate while scanning the charged-particle beam in a main-scanning direction by the deflector and scanning the substrate in a sub-scanning direction by the stage mechanism. The apparatus includes a blanker unit configured to control irradiation and unirradiation of the substrate with the charged-particle beam, and a controller configured to control the deflector to deflect the charged-particle beam in the sub-scanning direction by an amount of driving of the substrate in the sub-scanning direction by the stage mechanism during a period of time from stop of drawing on the substrate until restart thereof when the drawing on the substrate is stopped and then restarted while the substrate is driven in the sub-scanning direction by the stage mechanism.

公开(公告)号：US08564225B1

公开(公告)日：2013-10-22

申请号：US13585832

申请日：2012-08-15

申请人： Kim L. Hailey ,  Robert O. Conn

发明人： Kim L. Hailey ,  Robert O. Conn

IPC分类号： H05H7/00

CPC分类号： H01J37/302 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/08 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0432 ,  H01J2237/0437 ,  H01J2237/04735 ,  H01J2237/061 ,  H01J2237/0802 ,  H01J2237/0815 ,  H01J2237/20228 ,  H01J2237/30416 ,  H01J2237/31749 ,  H01J2237/31755 ,  H01J2237/31766 ,  H05H9/042

摘要： An accelerator assembly includes an acceleration channel that passes in a straight line through a plurality of accelerator cells. Each cell includes an acceleration region and a drift region. The drift region includes a high voltage plate and a grid electrode, where the grid electrode is disposed between the high voltage plate and the channel. In each cell, a large DC voltage is present on the high voltage plate. A voltage on the grid electrode is controlled such that at a first time an ion in the channel is attracted toward the high voltage plate, and such that at a second time the ion is shielded and is not attracted toward the high voltage plate. In one specific example, the assembly is part of a Direct Write On Wafer (DWOW) printing system that can direct write an image onto a 300 mm diameter wafer in one minute.

摘要翻译： 加速器组件包括加速通道，其以直线通过多个加速器单元。 每个单元包括加速区和漂移区。 漂移区域包括高压板和栅格电极，其中格栅电极设置在高压板和通道之间。 在每个电池中，在高压板上存在大的直流电压。 控制栅电极上的电压，使得第一次将通道中的离子吸引到高压板，并且在第二时间离子被屏蔽并且不被吸引到高压板。 在一个具体的示例中，组件是直接写入晶圆（DWOW）打印系统的一部分，可以在一分钟内直接将图像写入到300mm直径的晶片上。

公开(公告)号：US20130056647A1

公开(公告)日：2013-03-07

申请号：US13597699

申请日：2012-08-29

申请人： Ryoichi YOSHIKAWA ,  Munehiro Ogasawara

发明人： Ryoichi YOSHIKAWA ,  Munehiro Ogasawara

IPC分类号： G21K5/04

CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/31764 ,  H01J2237/31766 ,  H01L21/263 ,  H01L21/2633 ,  H01L21/3085

摘要： In accordance with one aspect of this invention, a multi charged particle beam writing apparatus includes an aperture member, in which a plurality of openings are formed, configured to form multi-beams by making portions of the charged particle beam pass through the plurality of openings; a plurality of blankers configured to perform blanking-deflect regarding beams corresponding to the multi-beams; a writing processing control unit configured to control writing processing with a plurality of beams having passed through different openings among the plurality of openings being irradiated on the target object at a predetermined control grid interval; and a dose controlling unit configured to variably control a dose of a beam associated with deviation according to a deviation amount when an interval between the plurality of beams irradiated is deviated from the control grid interval.