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1.发明申请公开(公告)号：US20220372629A1
公开(公告)日：2022-11-24
申请号：US17761777
申请日：2020-09-17
发明人： Jörg VETTER , Jürgen BECKER , Johann KARNER
摘要： A substrate having a multilayer coating system in the form of a surface coating, which has an outer cover layer comprising amorphous carbon, and a coating process for producing a substrate. At least a first MoaNx support layer is provided between the substrate and the cover layer, which support layer has a nitrogen content x, referred to an Mo content a, which is in the range of 25 at %≤x≤55 at %, with x+a=100 at %.
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公开(公告)号：US20190153584A1
公开(公告)日：2019-05-23
申请号：US16091220
申请日：2017-04-07
发明人： Johann KARNER , Neir BEGANOVIC , Juergen RAMM , Beno WIDRIG
摘要： The present invention relates to a component comprising a surface coated with a coating comprising a MoxCryN layer, where x and y correspond to the coefficients of Mo content and Cr content in atomic percentage, respectively, when only Mp and Cr are considered, and so x+y is considered to be 100 at %.
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3.发明申请COATING COMPRISING A MO-N-BASED LAYER IN WHICH THE MOLYBDENUM NITRIDE IS PROVIDED AS A DELTA PHASE 审中-公开包含作为三相氮氧化物提供的基于MO-N的层的涂层公开(公告)号：US20170029930A1
公开(公告)日：2017-02-02
申请号：US15039591
申请日：2014-12-01
发明人： Jürgen RAMM , Johann KARNER
CPC分类号： C23C14/0641 , C23C14/325
摘要： A coating and a method for the production thereof. The coating includes at least one Mo—N-based layer of hard material which at least predominantly contains the hexagonal phase of the molybdenum nitride δ-MoN. The intensity ratio of the two peaks (δ-MoN 220)/(δ-MoN 200) are ≧3, preferably ≧10, especially preferably ≧30.
摘要翻译： 一种涂料及其制备方法。 该涂层包括至少主要含有氮化钼δ-MoN的六方相的至少一种Mo-N基硬质材料层。 两个峰（δ-MoN 220）/（δ-MoN 200）的强度比为≥3，优选为≥10，特别优选为≥30。
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公开(公告)号：US20220275498A1
公开(公告)日：2022-09-01
申请号：US17631842
申请日：2020-07-31
发明人： Jürgen BECKER , Neir BEGANOVIC , Johann KARNER , Timea STELZIG , Jörg VETTER
摘要： A method to produce a hard coating onto a substrate, wherein the hard coating comprises a hydrogen-free amorphous carbon coating, wherein the amorphous carbon coating is deposited onto the substrate using a cathodic arc discharge deposition technique, wherein a bias voltage is applied to the substrate with an absolute value that is greater than 0 V, preferably greater than 10 V and less than 1000 V, and wherein the absolute value of the bias voltage is increased during the coating process to obtain a first structure and a second structure and a gradient between the first and the second structure along the coating thickness, wherein the first and the second structure comprise sp2 and sp3 carbon bonds but differ in their relative concentration, wherein at least one coating pause is applied during the coating process in order to reduce the substrate temperature during the coating pause.
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