HIGH-FREQUENCY TREATMENT TOOL, MEDICAL SYSTEM, AND METHOD FOR REMOVING ATTACHED MATTER ON HIGH-FREQUENCY TREATMENT TOOL

    公开(公告)号:US20220304747A1

    公开(公告)日:2022-09-29

    申请号:US17839702

    申请日:2022-06-14

    Abstract: Provided is a high-frequency treatment tool including: a sheath having an inner hole that passes therethrough in a longitudinal direction; a first electrode portion that is formed in a rod shape, that passes through the inner hole of the sheath to protrude from a distal end of the sheath, and that is configured to apply a high-frequency current; a second electrode portion that is disposed at a position at which the second electrode portion is electrically connected with the first electrode portion; and a power source that uses the first electrode portion as a negative electrode, that uses the second electrode portion as a positive electrode, and that supply a current between the first electrode portion and the second electrode portion so that a state in which attached matter attached to the first electrode portion is lifted from the first electrode portion due to osmosis is created.

    LIGHT SOURCE DEVICE, ENDOSCOPE SYSTEM, AND CONTROL METHOD

    公开(公告)号:US20220287554A1

    公开(公告)日:2022-09-15

    申请号:US17831649

    申请日:2022-06-03

    Abstract: A light source device includes a first light source, a second light source, and a processor. The processor controls, based on spectrum setting information, an emitted light amount of the first light source and an emitted light amount of the second light source so that the emitted light amount of the first light source becomes larger than the emitted light amount of the second light source. The observation object includes a region of interest, a merkmal, and a peripheral portion. The spectrum setting information is set based on a merkmal observed ratio that is a ratio between a spectral reflectance in the merkmal and a spectral reflectance in the peripheral portion. A degree of disassociation of the merkmal observed ratio in the first wavelength region from 1 is greater than a degree of disassociation of the merkmal observed ratio in the second wavelength region from 1.

Patent Agency Ranking