公开(公告)号：US10604600B2

公开(公告)日：2020-03-31

申请号：US16082743

申请日：2017-03-10

Applicant: OSAKA SODA CO., LTD.

Inventor： Hideaki Umakoshi ,  Naruhito Iwasa ,  Hiroki Yamamoto

IPC: C08F2/46 ,  C08F2/50 ,  C08G61/04 ,  C08F18/08 ,  C08F2/44 ,  C08F2/48 ,  C09J4/06 ,  C09J11/06 ,  C09J131/06 ,  C09J131/04 ,  C09J133/10

Abstract: The objection of the present invention is to provide a photocurable resin composition having deep curability. The photocurable resin composition comprises an allyl polymer (a) produced by polymerization of an allyl compound represented by the following formula (1), a photocurable compound (b), and a photopolymerization initiator (c). In the formula, n represents an integer of 2 to 4; Z is selected from a binding site, an n-valent aliphatic chain hydrocarbon group optionally having a hydroxyl group, an n-valent alicyclic hydrocarbon group optionally having an alkyl group, and an n-valent aromatic hydrocarbon group optionally having an alkyl group; n is 2 and two —COOCH2CH═CH2 moieties are directly bonded to each other when Z is a binding site. ZCOOCH2CH═CH2)n  (1)