公开(公告)号：US11372199B2

公开(公告)日：2022-06-28

申请号：US16845419

申请日：2020-04-10

Applicant: Okinawa Institute of Science and Technology School Corporation

Inventor： Julien Dominique Georges Madeo ,  Michael K. L. Man ,  Keshav M. Dani

IPC: G02B7/182 ,  G02B19/00 ,  H05G2/00

Abstract: Systems and methods for generating extreme ultraviolet radiation from plasma are described herein. In an embodiment, gas is provided to a gas target within a vacuum chamber. A pulse laser or a pulse laser-driven wavelength conversion system provides a beam which is focused through a lens or microscope object onto the gas target to produce plasma. A collection mirror is then used to guide an extreme ultraviolet radiation beam from the plasma to a target location.