System And Method For Black Coating Of Camera Cubes At Wafer Level
    1.
    发明申请
    System And Method For Black Coating Of Camera Cubes At Wafer Level 有权
    在晶片级别的相机立方体的黑色涂层的系统和方法

    公开(公告)号:US20150318325A1

    公开(公告)日:2015-11-05

    申请号:US14270281

    申请日:2014-05-05

    CPC classification number: H01L27/14685 H01L27/1462 H01L27/14687

    Abstract: A method for black coating camera cubes at wafer level includes expanding the gap between individual diced camera cubes of the wafer by stretching tape securing the diced camera cubes. The method includes applying a black coating layer to the stretched camera cubes, laser trimming undesired portions of the black coating layer, and removing the undesired portions of the black coating layer.

    Abstract translation: 用于在晶片级黑色涂布相机立方体的方法包括通过固定切割的相机立方体的拉伸带扩大晶片的各个切割相机立方体之间的间隙。 该方法包括将黑色涂层施加到拉伸的相机立方体上,激光修整黑色涂层的不希望的部分,以及去除黑色涂层的不希望的部分。

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