公开(公告)号：US09540262B2

公开(公告)日：2017-01-10

申请号：US14032477

申请日：2013-09-20

Applicant: PANASONIC CORPORATION

Inventor： Hironori Kumagai ,  Shin-ichi Imai

IPC: C02F1/48 ,  C02F1/46 ,  C02F1/461

CPC classification number: C02F1/48 ,  C02F1/4608 ,  C02F2001/46123 ,  C02F2001/46138 ,  C02F2001/46152 ,  C02F2201/46125 ,  C02F2201/46175 ,  C02F2201/4619 ,  C02F2209/38 ,  C02F2303/04 ,  C02F2305/023 ,  C02F2307/12

Abstract: The plasma-generating apparatus includes a treatment vessel 509 containing to-be-treated water 510, a first electrode 504 and a second electrode 502 within the treatment vessel, a bubble-generating part which generate a bubble 506 such that a surface where conductor of the first electrode 504 is exposed to the to-be-treated water is positioned within the bubble 506, a gas-supplying apparatus 505 which supplies gas to the bubble-generating part, a pulsed power supply 501 connected to the first and the second electrodes 502 and 504, a control apparatus 520 which controls one or both of the gas-supplying apparatus and the power supply such that the voltage is applied between the first and the second electrodes 502 and 504 when at least surface where the conductor of the first electrode 504 is exposed is positioned within the bubble.

Abstract translation: 等离子体产生装置包括处理容器509，其包含要处理的水510，处理容器内的第一电极504和第二电极502，产生气泡的气泡产生部分，使得其中导体 第一电极504暴露于被处理水位于气泡506内，气体供给装置505向气泡发生部供应气体，连接到第一和第二电极的脉冲电源501 控制装置520，其控制气体供给装置和电源中的一个或两个，使得当至少第一电极的导体的表面处施加电压时，在第一和第二电极502和504之间施加电压 504暴露在气泡内。

公开(公告)号：US09677940B2

公开(公告)日：2017-06-13

申请号：US14184233

申请日：2014-02-19

Applicant: PANASONIC CORPORATION

Inventor： Hironori Kumagai ,  Shin-ichi Imai

IPC: G01J3/443 ,  G01N21/67 ,  G01N21/69

CPC classification number: G01J3/443 ,  G01N21/67 ,  G01N21/69

Abstract: An elemental analysis apparatus 101 includes a treatment vessel 108 of which at least a part is optically transparent, a first electrode 104 covered by insulator 103, a second electrode 102, a bubble-generating part which generates a bubble 106, a gas-supplying apparatus 105 which supplies gas to the bubble-generating part in an amount necessary for generating the bubble 106, a power supply 101 which applies voltage between the first electrode 104 and the second electrode 102, and an optical detection device 110 which determines an emission spectrum of plasma that is generated by application of the voltage, and the apparatus conducts qualitatively or quantitatively analysis of a component contained in the liquid 109 based on the emission spectrum determined by the optical detection device 110.