利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

79 条记录 (耗时 0.034 秒)

    Plane-parallel structures of silicon/silicon oxide
    2.
    发明授权
    Plane-parallel structures of silicon/silicon oxide 失效
    硅/氧化硅的平面平行结构

    公开(公告)号：US07273522B2

    公开(公告)日：2007-09-25

    申请号：US10517283

    申请日：2003-06-16

    申请人： Patrice Bujard ,  Holger Leybach ,  Hilmar Weinert

    发明人： Patrice Bujard ,  Holger Leybach ,  Hilmar Weinert

    IPC分类号： C04B14/04

    CPC分类号： C09C1/0021 ,  C01P2004/54 ,  C09C1/0015 ,  C09C1/0018 ,  C09C1/0024 ,  C09C1/0039 ,  C09C2200/1037 ,  C09C2200/301 ,  C09C2200/302 ,  C09C2200/308 ,  C09C2220/20

    摘要： The present invention relates to plane-parallel structures of silicon/silicon oxide (silicon/silicon oxide flakes), obtainable by heating plane-parallel structures of SiOy in an oxygen-free atmosphere at a temperature above 400° C., wherein 0.70≦y≦1.8, or plane-parallel structures of silicon/silicon oxide, obtainable by heating plane-parallel structures of SiOx in an oxygen-free atmosphere at a temperature above 400° C., wherein 0.03≦x≦0.95, a process for their production and their use for the production of interference pigments.

    摘要翻译： 本发明涉及硅/氧化硅（硅/氧化硅薄片）的平面 - 平行结构，其可通过在无氧气氛中在高于400℃的温度下加热SiO 2的平面平行结构而获得 ℃，其中0.70 <= y <= 1.8，或者通过在无氧气氛中在一定温度下加热SiO 2的平面平行结构而获得的硅/氧化硅的平面平行结构 高于400℃，其中0.03 <= x <= 0.95，其生产方法及其用于生产干涉颜料的方法。

    Interference pigments on the basis of silicon oxides
    3.
    发明申请
    Interference pigments on the basis of silicon oxides 失效
    基于氧化硅的干涉颜料

    公开(公告)号：US20060042507A1

    公开(公告)日：2006-03-02

    申请号：US10530099

    申请日：2003-10-07

    申请人： Patrice Bujard ,  Holger Leybach

    发明人： Patrice Bujard ,  Holger Leybach

    IPC分类号： C09C1/00

    CPC分类号： C09C1/0024 ,  C01P2004/54 ,  C09C2200/1037 ,  C09C2200/301 ,  C09D5/36 ,  Y10T428/2991 ,  Y10T428/2993

    摘要： The present invention relates to pigments, the particles of which generally have a length of from 2 μm to 5 mm, a width of from 2 μm to 2 mm, and a thickness of from 20 nm to 2 μm, and a ratio of length to thickness of at least 2:1, wherein the particles contain a core of SiOy with 0.70≦y≦1.8, especially 1.40≦y≦1.8, having two substantially parallel faces, the distance between which is the shortest axis of the core, comprising (a) a material, especially a metal oxide, having a high index of refraction; or (a) a thin semi-transparent metal layer; a process for their production and their use in paints, ink-jet printing, for dyeing textiles, for pigmenting coatings (paints), printing inks, plastics, cosmetics, glazes for ceramics and glass.

    摘要翻译： 本发明涉及颜料，其颗粒通常具有2μm至5mm的长度，2μm至2mm的宽度和20nm至2μm的厚度，并且其长度与 至少2:1的厚度，其中所述颗粒包含具有0.70≤y≤1.8的芯，特别是1.40 <= y <= 1.8，具有两个基本上平行的面，所述距离 在其之间是芯的最短轴线，包括（a）具有高折射率的材料，特别是金属氧化物; 或（a）薄的半透明金属层; 用于油漆，喷墨印刷，染色纺织品，着色涂料（油漆），印刷油墨，塑料，化妆品，陶瓷和玻璃的釉料的生产过程。

    Interference pigments on the basis of silicon oxides
    4.
    发明申请
    Interference pigments on the basis of silicon oxides 失效
    基于氧化硅的干涉颜料

    公开(公告)号：US20090169499A1

    公开(公告)日：2009-07-02

    申请号：US12380364

    申请日：2009-02-26

    申请人： Patrice Bujard ,  Holger Leybach

    发明人： Patrice Bujard ,  Holger Leybach

    IPC分类号： C04B14/04 ,  C03C8/00 ,  A61Q5/10 ,  A61K8/25 ,  A61Q1/02

    CPC分类号： C09C1/0024 ,  C01P2004/54 ,  C09C2200/1037 ,  C09C2200/301 ,  C09D5/36 ,  Y10T428/2991 ,  Y10T428/2993

    摘要： The present invention relates to pigments, the particles of which generally have a length of from 2 μm to 5 mm, a width of from 2 μm to 2 mm, and a thickness of from 20 nm to 2 μm, and a ratio of length to thickness of at least 2:1, wherein the particles contain a core of SiO2 or a silicon/silicon oxide obtained by heating SiOy flakes with 1.1≦y≦1.8 in an oxygen-free atmosphere at a temperature of at least 400° C., which core has a narrow distribution of particle sizes and two substantially parallel faces, the distance between which is the shortest axis of the core, and a material layer having a high index of refraction a metal oxide; a process for their production and their use in paints, ink-jet printing, for dyeing textiles, for pigmenting coatings (paints), printing inks, plastics, cosmetics, glazes for ceramics and glass.

    摘要翻译： 本发明涉及颜料，其颗粒通常具有2μm至5mm的长度，2μm至2mm的宽度和20nm至2μm的厚度，并且其长度与 至少2:1的厚度，其中所述颗粒含有通过在无氧气氛中在至少400℃的温度下加热1.1≤y≤1.8的SiO y薄片而获得的SiO 2核心或硅/氧化硅 ，该芯具有窄的粒度分布和两个基本上平行的面，其间的距离是芯的最短轴线，以及具有高折射率金属氧化物的材料层; 用于油漆，喷墨印刷，染色纺织品，着色涂料（油漆），印刷油墨，塑料，化妆品，陶瓷和玻璃的釉料的生产过程。

    Methods of producing plane-parallel structures of silicon suboxide, silicon dioxide and/or silicon carbide, plane-parallel structures obtainable by such methods, and the use thereof
    5.
    发明授权
    Methods of producing plane-parallel structures of silicon suboxide, silicon dioxide and/or silicon carbide, plane-parallel structures obtainable by such methods, and the use thereof 失效
    生成低氧化硅，二氧化硅和/或碳化硅的平面平行结构的方法，可通过这些方法获得的平面平行结构及其用途

    公开(公告)号：US07256425B2

    公开(公告)日：2007-08-14

    申请号：US10504412

    申请日：2003-02-11

    申请人： Hilmar Weinert ,  Patrice Bujard ,  Rüdiger Hainz

    发明人： Hilmar Weinert ,  Patrice Bujard ,  Rüdiger Hainz

    IPC分类号： H01L25/15 ,  H01L31/0312

    CPC分类号： C09C1/0018 ,  C01P2004/54 ,  C09C1/0015 ,  C09C1/0021 ,  C09C2200/1037 ,  C09C2200/301 ,  C09C2200/302 ,  C09C2220/20 ,  C23C14/0005 ,  C23C14/024 ,  C23C14/10 ,  Y02T50/67

    摘要： A product produced in a PVD method is described, which consists of thin plane-parallel structures having a thickness in the range from 20 to 2000 nm and small dimensions in the range below one mm. Production is carried out by condensation of silicon suboxide onto a carrier passing by way of the vaporisers. The carrier is pre-coated, before condensation of the silicon suboxide, with a soluble, inorganic or organic separating agent in a PVD method. All steps, including that of detaching the product by dissolution, can be carried out continuously and simultaneously at different locations. As final step, the SiOy may be oxidised to SiO2 in an oxygen-containing gas at atmospheric pressure and temperatures of more than 200° C. or SiOy may be converted to SiC at the surface of the plane-parallel structures in a carbon-containing gas at from 500° C. to 1500° C. The products produced in that manner are distinguished by high uniformity of thickness.

    摘要翻译： 描述了以PVD方法生产的产品，其由厚度在20至2000nm的薄平面平行结构和小于1mm的范围内的小尺寸组成。 通过将低氧化硅冷凝到通过蒸发器的载体上进行生产。 载体在低聚硅氧烷冷凝前用PVD法中的可溶性，无机或有机分离剂进行预涂。 包括通过溶解分离产品的所有步骤可以在不同的地点连续地同时进行。 作为最后的步骤，SiO 2可以在含氧气体中在大气压和大于200℃的温度下氧化成SiO 2， y可以在500℃至1500℃的含碳气体的平面 - 平行结构的表面处转化为SiC。以这种方式制造的产品的厚度均匀性很高。

    Interference pigments on the basis of silicon oxides
    6.
    发明授权
    Interference pigments on the basis of silicon oxides 失效
    基于氧化硅的干涉颜料

    公开(公告)号：US07959727B2

    公开(公告)日：2011-06-14

    申请号：US12380364

    申请日：2009-02-26

    申请人： Patrice Bujard ,  Holger Leybach

    发明人： Patrice Bujard ,  Holger Leybach

    IPC分类号： C04B14/04 ,  C04B14/00 ,  C09C1/04 ,  C09C1/14 ,  C09C1/36 ,  B32B5/16 ,  B32B9/00

    CPC分类号： C09C1/0024 ,  C01P2004/54 ,  C09C2200/1037 ,  C09C2200/301 ,  C09D5/36 ,  Y10T428/2991 ,  Y10T428/2993

    摘要： The present invention relates to pigments, the particles of which generally have a length of from 2 μm to 5 mm, a width of from 2 μm to 2 mm, and a thickness of from 20 nm to 2 μm, and a ratio of length to thickness of at least 2:1, wherein the particles contain a core of SiO2 or a silicon/silicon oxide obtained by heating SiOy flakes with 1.1≦y≦1.8 in an oxygen-free atmosphere at a temperature of at least 400° C., which core has a narrow distribution of particle sizes and two substantially parallel faces, the distance between which is the shortest axis of the core, and a material layer having a high index of refraction a metal oxide; a process for their production and their use in paints, ink-jet printing, for dyeing textiles, for pigmenting coatings (paints), printing inks, plastics, cosmetics, glazes for ceramics and glass.

    摘要翻译： 本发明涉及颜料，其颗粒的长度通常为2μm至5mm，宽度为2μm至2mm，厚度为20nm至2μm，长度与 至少2:1的厚度，其中所述颗粒含有通过在无氧气氛中在至少400℃的温度下加热具有1.1≤n1E，y和n1E1.8的SiOy薄片获得的SiO 2核心或硅/氧化硅。 ，该芯具有窄的粒度分布和两个基本上平行的面，其中的距离是芯的最短轴线，以及具有高折射率金属氧化物的材料层; 用于油漆，喷墨印刷，染色纺织品，着色涂料（油漆），印刷油墨，塑料，化妆品，陶瓷和玻璃的釉料的生产过程。

    Interference pigments on the basis of silicon oxides
    7.
    发明授权
    Interference pigments on the basis of silicon oxides 失效
    基于氧化硅的干涉颜料

    公开(公告)号：US07517404B2

    公开(公告)日：2009-04-14

    申请号：US10530099

    申请日：2003-10-07

    申请人： Patrice Bujard ,  Holger Leybach

    发明人： Patrice Bujard ,  Holger Leybach

    IPC分类号： C04B14/04 ,  C04B14/00 ,  C09C1/00

    CPC分类号： C09C1/0024 ,  C01P2004/54 ,  C09C2200/1037 ,  C09C2200/301 ,  C09D5/36 ,  Y10T428/2991 ,  Y10T428/2993

    摘要： The present invention relates to pigments, the particles of which generally have a length of from 2 μm to 5 mm, a width of from 2 μm to 2 mm, and a thickness of from 20 nm to 2 μm, and a ratio of length to thickness of at least 2:1, wherein the particles contain a core of SiOy with 0.70≦y≦1.8, especially 1.40≦y≦1.8, having two substantially parallel faces, the distance between which is the shortest axis of the core, comprising (a) a material, especially a metal oxide, having a high index of refraction; or (a) a thin semi-transparent metal layer; a process for their production and their use in paints, ink-jet printing, for dyeing textiles, for pigmenting coatings (paints), printing inks, plastics, cosmetics, glazes for ceramics and glass.

    摘要翻译： 本发明涉及颜料，其颗粒通常具有2μm至5mm的长度，2μm至2mm的宽度和20nm至2μm的厚度，并且其长度与 至少2:1的厚度，其中颗粒包含具有0.70 <= y <= 1.8，特别是1.40 <= y <= 1.8的SiO y核，具有两个基本上平行的面，其间的距离是 芯，包括（a）具有高折射率的材料，特别是金属氧化物; 或（a）薄的半透明金属层; 用于油漆，喷墨印刷，染色纺织品，着色涂料（油漆），印刷油墨，塑料，化妆品，陶瓷和玻璃的釉料的生产过程。