Fabrication of waveguides and bragg gratings with uv-irradiation
    1.
    发明申请
    Fabrication of waveguides and bragg gratings with uv-irradiation 有权
    用紫外辐射制造波导和布拉格光栅

    公开(公告)号:US20060127024A1

    公开(公告)日:2006-06-15

    申请号:US10535010

    申请日:2003-05-19

    IPC分类号: G02B6/34

    摘要: A method of simultaneously defining a waveguide and grating in a sample of photosensitive material comprises providing a sample of material (24) having a region which is photosensitive to light of a specific wavelength, generating a spot of light (22) at the specific wavelength, the spot having a periodic intensity pattern of high and low intensity fringes, and a width which is related to the width of the channel, positioning the spot within the photosensitive region and causing relative movement between the sample and the light spot along the desired path of the waveguide/grating define a channel of altered refractive index by exposing parts of the photosensitive region to the light spot. Modulation of the light spot to produce multiple exposures produces a grating, while continuous exposure results in a uniform waveguide. These structures can be written in straight lines or around curves, and can be accurately overwritten, so that complex optical devices can be produced in a single fabrication step.

    摘要翻译: 在感光材料的样本中同时限定波导和光栅的方法包括提供具有对特定波长的光敏感的区域的材料样品(24),产生特定波长的光点(22) 具有高强度条纹和低强度条纹的周期性强度图案的斑点以及与通道宽度相关的宽度,将斑点定位在感光区域内,并引起样品和光点之间沿着期望路径的相对移动 波导/光栅通过将光敏区域的一部分暴露于光点来限定改变的折射率的通道。 调制光斑以产生多次曝光产生光栅,而连续曝光导致均匀的波导。 这些结构可以以直线或曲线周围的方式写入,并且可以被精确地覆盖,使得可以在单个制造步骤中生成复杂的光学器件。