公开(公告)号：US20050128460A1

公开(公告)日：2005-06-16

申请号：US10735846

申请日：2003-12-16

申请人： Petrus Marinus Van Den Biggelaar ,  Henrikus Cox ,  Yin Tso ,  Sjoerd Donders ,  Theodorus Knoops

发明人： Petrus Marinus Van Den Biggelaar ,  Henrikus Cox ,  Yin Tso ,  Sjoerd Donders ,  Theodorus Knoops

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/58

CPC分类号： G03F7/70508 ,  G03F7/70725

摘要： In a lithographic projection apparatus and a device manufacturing method, a movable part is controlled to produce a motion, an absolute value of at least one of a fourth and a higher derivative to time of the position of the motion being limited to less than a maximal value. Specifying at least one of a fourth and a higher derivative to time of the position may help to improve settling behavior to obtain more accurate positioning. Further, a movable part may be controlled to produce an acceleration of the movable part having a high at least one of a third and a higher derivative to time of the position of the motion at a start portion of the acceleration and a corresponding low at least one of a third and a higher derivative to time of the position of the motion at an end portion of the acceleration, the absolute value of the high at least one of the third and the higher derivative to time of the position of the motion being larger than the absolute value of the corresponding low at least one of the third and the higher derivative to time of the position of the motion.

摘要翻译： 在光刻投影装置和装置制造方法中，可动部被控制以产生运动，将运动位置的第四和更高的导数与时间中的至少一个的绝对值限制为小于最大值 值。 指定位置的时间的第四和更高的派生中的至少一个有助于改善沉降行为以获得更准确的定位。 此外，可以控制可移动部分，以产生具有高于加速度起始部分处的运动位置的第三和更高导数的至少一个的可移动部分的加速度，并且至少一个对应的低 对加速度的端部处的运动位置的时间的三分之一或更高的导数之一，运动位置的第三和更高的导数与时间的高度的绝对值较大 比相应的低的运动的位置的时间的第三和更高的导数中的至少一个的绝对值。

公开(公告)号：US20050041227A1

公开(公告)日：2005-02-24

申请号：US10894368

申请日：2004-07-20

申请人： Petrus Marinus Van Den Biggelaar

发明人： Petrus Marinus Van Den Biggelaar

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC分类号： G03F7/70533 ,  G03F7/70466

摘要： A lithographic apparatus is presented that provides versatile processing time and accuracy selection. The apparatus includes a substrate holder configured to hold a substrate; a radiation system configured to condition a beam of radiation; a support structure configured to support a patterning device that imparts a desired pattern onto the beam of radiation; a projection system that projects the patterned beam onto a target portion of the substrate; and a selection system that selects one out of at least two different operational modes of the lithographic apparatus. The first operational mode is associated with performing a process within a first time period at a first level of accuracy and a second operational mode is associated with performing the process within a second time period at a second level of accuracy. The first time period is shorter than the second time period and the first level of accuracy is lower than the second level of accuracy.

摘要翻译： 提供了一种提供通用处理时间和精度选择的光刻设备。 该装置包括：被配置为保持基板的基板保持器; 配置成调节辐射束的辐射系统; 支撑结构，其构造成支撑图案形成装置，所述图案形成装置将期望的图案赋予所述辐射束; 投影系统，其将图案化的光束投影到基板的目标部分上; 以及选择系统，其从光刻设备的至少两种不同的操作模式中选出一个。 第一操作模式与在第一时间段内以第一精度水平执行处理相关联，并且第二操作模式与在第二时间段内以第二准确度水平执行处理相关联。 第一时间段比第二时间段短，第一准确度低于第二准确度。