Dose measurement and uniformity monitoring system for ion implantation
    1.
    发明授权
    Dose measurement and uniformity monitoring system for ion implantation 失效
    用于离子注入的剂量测量和均匀性监测系统

    公开(公告)号:US4751393A

    公开(公告)日:1988-06-14

    申请号:US864584

    申请日:1986-05-16

    摘要: Apparatus for determining ion dose and ion dose uniformity of an ion beam scanned over a target plane in response to scanning signals includes a mask assembly for sensing the beam current at several different locations and providing a single beam current signal. The mask assembly includes a mask plate with sensing apertures and an annular Faraday cup aligned with the apertures for sensing beam current. The beam current signal is integrated over time to determine ion dose. A demultiplexer, in response to x and y scan signals, separates the beam current signal into separate signal components from each sensing aperture. Ion dose uniformity is determined by comparing the separate signal components, integrated over time, with an average value of the signal component.

    摘要翻译: 用于确定响应于扫描信号在目标平面上扫描的离子束的离子剂量和离子剂量均匀性的装置包括用于感测几个不同位置处的束电流并提供单个束电流信号的掩模组件。 掩模组件包括具有感测孔的掩模板和与孔对准的环形法拉第杯,用于感测束电流。 束电流信号随时间积分以确定离子剂量。 解复用器响应于x和y扫描信号,将波束电流信号从每个感测孔分离成独立的信号分量。 通过将随时间积分的单独信号分量与信号分量的平均值进行比较来确定离子剂量均匀性。