公开(公告)号：US20190338439A1

公开(公告)日：2019-11-07

申请号：US16467728

申请日：2017-12-08

申请人： RENA TECHNOLOGIES GMBH

发明人： MICHAEL PASSIG ,  MARKUS SIEBER ,  NORBERT BAY ,  JOHN BURSCHIK ,  DAMIAN PYSCH ,  WOLFGANG DUEMPELFELD ,  MARKUS UIHLEIN ,  HOLGER KUEHNLEIN ,  THOMAS HIRT ,  ANDREAS KETTERER

IPC分类号： C25D17/00 ,  C25D5/02 ,  C25D17/02 ,  C25D5/18 ,  C25D7/06 ,  C25D21/12

摘要： A continuous separation installation for the galvanic deposition of a substance on objects includes contacting devices having at least one electrically conductive contact arm. The contacting devices are arranged in areas of the continuous separation installation which are free from an electrolyte used for the galvanic deposition of the substance. There is also described an assembly for a continuous separation installation.