公开(公告)号：US11877575B2

公开(公告)日：2024-01-23

申请号：US17221550

申请日：2021-04-02

Applicant: RHODIA OPERATIONS

Inventor： Amit Sehgal ,  Kamel Ramdani ,  Christopher Plummer ,  Huw Evans

IPC: A01N25/10 ,  A01N25/30 ,  A01N33/12

CPC classification number: A01N25/10 ,  A01N25/30 ,  A01N33/12

Abstract: An antimicrobial composition that includes: an antimicrobial component having at least one quaternary ammonium compound; a synthetic polymer that includes: at least one cationic monomer Ab, optionally, at least one anionic monomer Ba, and optionally, at least one non-ionic monomer Ca; an organic acid; and a surfactant selected from cationic surfactants, amphoteric surfactants and combinations thereof, wherein the composition is free of non-ionic surfactants. This composition when applied to a surface provides robust long lasting disinfection.

公开(公告)号：US10980230B2

公开(公告)日：2021-04-20

申请号：US16379708

申请日：2019-04-09

Applicant: RHODIA OPERATIONS

Inventor： Amit Sehgal ,  Kamel Ramdani ,  Christopher Plummer ,  Huw Evans

IPC: A01N25/10 ,  A01N25/30 ,  A01N33/12

Abstract: An antimicrobial composition that includes: an antimicrobial component having at least one quaternary ammonium compound; a synthetic polymer that includes: at least one cationic monomer Ab, optionally, at least one anionic monomer Ba, and optionally, at least one non-ionic monomer Ca; an organic acid; and a surfactant selected from cationic surfactants, amphoteric surfactants and combinations thereof, wherein the composition is free of non-ionic surfactants. This composition when applied to a surface provides robust long lasting disinfection.