公开(公告)号：US11497210B2

公开(公告)日：2022-11-15

申请号：US16379685

申请日：2019-04-09

Applicant: RHODIA OPERATIONS

Inventor： Amit Sehgal ,  Thomas Brophy ,  Kamel Ramdani

IPC: A01N25/10 ,  A01N25/30 ,  A01N33/12

Abstract: An antimicrobial composition that includes: an antimicrobial component having at least one quaternary ammonium compound; a cationic polysaccharide; an organic acid; and a surfactant selected from cationic surfactants, amphoteric surfactants, nonionic surfactants and combinations thereof. This composition when applied to a surface provides robust long lasting disinfection.

公开(公告)号：US11877575B2

公开(公告)日：2024-01-23

申请号：US17221550

申请日：2021-04-02

Applicant: RHODIA OPERATIONS

Inventor： Amit Sehgal ,  Kamel Ramdani ,  Christopher Plummer ,  Huw Evans

IPC: A01N25/10 ,  A01N25/30 ,  A01N33/12

CPC classification number: A01N25/10 ,  A01N25/30 ,  A01N33/12

Abstract: An antimicrobial composition that includes: an antimicrobial component having at least one quaternary ammonium compound; a synthetic polymer that includes: at least one cationic monomer Ab, optionally, at least one anionic monomer Ba, and optionally, at least one non-ionic monomer Ca; an organic acid; and a surfactant selected from cationic surfactants, amphoteric surfactants and combinations thereof, wherein the composition is free of non-ionic surfactants. This composition when applied to a surface provides robust long lasting disinfection.

公开(公告)号：US11375715B2

公开(公告)日：2022-07-05

申请号：US16789940

申请日：2020-02-13

Applicant: RHODIA OPERATIONS

Inventor： Amit Sehgal ,  Tamara Mamistvalova ,  Amanda Torres ,  Celine Burel ,  Kamel Ramdani

IPC: C11D1/835 ,  A01N33/12 ,  C11D3/37 ,  C11D11/00 ,  C11D1/62 ,  C11D3/00 ,  C11D1/00

Abstract: The present disclosure provides an antimicrobial composition that includes: an antimicrobial component having at least one quaternary ammonium compound; a synthetic polymer that includes: at least one cationic monomer Ab, optionally, at least one anionic monomer Ba, and optionally, at least one non-ionic monomer Ca; an organic acid; and a surfactant selected from cationic surfactants, amphoteric surfactants and combinations thereof; and at least one non-ionic surfactant selected from the group consisting of low hydrophilic-lipophilic balance (HLB) non-ionic surfactants with a delocalized electronic structure that have moderate to poor water solubility. This composition when applied to a surface demonstrates good cleaning ability and provides robust long lasting disinfection.

公开(公告)号：US10980230B2

公开(公告)日：2021-04-20

申请号：US16379708

申请日：2019-04-09

Applicant: RHODIA OPERATIONS

Inventor： Amit Sehgal ,  Kamel Ramdani ,  Christopher Plummer ,  Huw Evans

IPC: A01N25/10 ,  A01N25/30 ,  A01N33/12

Abstract: An antimicrobial composition that includes: an antimicrobial component having at least one quaternary ammonium compound; a synthetic polymer that includes: at least one cationic monomer Ab, optionally, at least one anionic monomer Ba, and optionally, at least one non-ionic monomer Ca; an organic acid; and a surfactant selected from cationic surfactants, amphoteric surfactants and combinations thereof, wherein the composition is free of non-ionic surfactants. This composition when applied to a surface provides robust long lasting disinfection.