公开(公告)号：US20210230329A1

公开(公告)日：2021-07-29

申请号：US15733961

申请日：2019-06-04

Applicant: RHODIA OPERATIONS

Inventor： Gilda LIZARRAGA ,  Jaime HUTCHISON ,  Laura GAGE ,  Marie-Pierre LABEAU ,  Guillaume GODY ,  Sophie DEROO ,  Philippe MARCHAL ,  Hamza CHOUIRFA

IPC: C08F220/38 ,  C09D133/14 ,  C09D5/16

Abstract: The present disclosure relates to the use of a composition for reducing or preventing colloids adhesion and/or fouling on a substrate, the composition comprising a copolymer having repeating units derived from one or more zwitterionic monomers and repeating units derived from one or more phosphorous acid monomers.